Components For Ion Implantation

Introduction to Ion Implantation

Ion implantation is a technical process in which ions are accelerated in an electric field and impact a target. The process alters the physical, chemical, or electrical properties of the target. It is used in the manufacture of semiconductor components, metal treatment, and materials science research.

The principal section of an implanter system is the beamline. In the beamline, ions are generated, focused, accelerated, and delivered to the target at high speed. The beamline materials must withstand high temperatures, aggressive process gases, and strong magnetic fields. Beamlines are manufactured from TZM, Molybdenum, Tungsten, Graphite, Ceramics, and Steel.

Stanford Advanced Materials supplies ion implantation components manufactured from Molybdenum, Tungsten and TZM (Titan-Zirconium-Molybdenum alloy). For further information, please submit your enquiry.

Main Features of Ion Implantation Components:

Material compatibility: The components are manufactured using high-purity materials that offer measured thermal conduction and resistance to operational conditions.

Precise design: Designers create the components to ensure accurate beam alignment and uniform dose distribution. Scattering effects are maintained at low levels.

Wear resistance: Components are coated or treated to increase wear resistance and reduce particle generation, thereby extending operating life.

Temperature control: Integrated heat dissipation methods maintain temperature stability during the ion implantation process and ensure consistent process outcomes.

Customisation: Designers tailor the components to match specific device configurations, implantation parameters, and semiconductor requirements.

Applications of Ion Implantation Components:

Semiconductor manufacturing: Ion implantation components are used to dope semiconductor wafers. They modify electrical properties required for integrated circuits and other devices.

Advanced research: Research institutions use the components for ion beam analysis, modifying material surfaces, and conducting studies on surface treatment.

Photovoltaics: Ion implantation is applied in the production of solar cells. Its use can improve light absorption and energy conversion efficiency, with quantitative results varying by process.

Materials engineering: Components are used to alter material properties such as hardness, conductivity, and corrosion resistance. Performance is verified by quality measurements.

Nanostructuring: Ion implantation produces patterns at the nanoscale on surfaces. These patterns are applied in optical, electronic, and biomaterials research.

Quality Assurance for Ion Implantation Components:

The components are sourced from manufacturers that adhere to strict quality and precision standards. Each component undergoes rigorous tests to meet the requirements of semiconductor manufacturing.