Mangan-Nickel (Mn/Ni) Evaporation Materials Description
Stanford Advanced Materials (SAM) focuses on manufacturing high purity evaporation materials. These materials are used in the semiconductor industry as well as in chemical vapour deposition (CVD) and physical vapour deposition (PVD) processes for display and optical applications. The collaboration between our development, manufacturing and analysis teams has enabled the production of evaporation materials that meet strict industry requirements.
The Mn/Ni evaporation materials are produced to precise specifications. They deliver defined levels of purity, consistency and reliability for applications in electronics, optics and other technical fields. Their performance in thin film deposition has been verified through rigorous testing.
Mangan-Nickel Evaporation Materials Specifications:
Material
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Manganese-Nickel
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Density
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7.2–8.9 g/cm³
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Melting Point
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1246–1455℃
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Purity
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99.9%
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Mangan-Nickel Evaporation Materials Features:
High Purity: The production process minimises contamination, thereby ensuring the materials comply with the required purity standards.
Accurate Composition: The ratio of manganese (Mn) to nickel (Ni) is controlled to exact specifications, thereby meeting deposition parameters.
Uniform Film Thickness: The deposition process enables control over film thickness across extensive substrate areas, thereby ensuring consistency.
Thermal Stability: The Mn/Ni materials maintain stable thermal performance during deposition. This prevents particle ejection and supports consistent film formation.
Versatile Applications: The materials are applicable in magnetic devices, optics, electronics and surface engineering.
Customised Solutions: Options are available to tailor the Mn/Ni evaporation materials to meet individual deposition requirements.
Mangan-Nickel Evaporation Materials Applications:
Our manganese-nickel evaporation materials are employed in several high-technology fields, including:
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Magnetic Devices: Used in the fabrication of magnetic thin films for sensors, data storage and magnetic coatings.
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Semiconductor Manufacturing: Suitable for thin film deposition in the production of integrated circuits.
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Optical Coatings: Applied in the production of optical coatings for lenses, mirrors and filters in optics and photonics.
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Surface Engineering: Employed to modify surface properties, improve wear resistance and reduce friction in various technical applications.
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Research and Development: Utilised in R&D projects that include thin film deposition processes, materials science studies and academic research.
Mangan-Nickel Evaporation Materials Packaging
The Mn/Ni evaporation materials are clearly labelled to allow efficient identification and quality control. Packaging is designed to prevent damage during storage or transport.
Why Choose Our Mangan-Nickel Evaporation Materials?
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Quality Assurance: The Mn/Ni evaporation materials undergo rigorous quality control processes to comply with industry standards.
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Technical Expertise: Our technical team possesses expertise in thin film deposition technology and provides focused technical support and consultation tailored to specific applications.
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Customised Solutions: Options are available to adapt the Mn/Ni evaporation materials to meet individual thin film deposition requirements, thereby ensuring the required performance.