VD0626 Iron-Aluminium (Fe/Al) Evaporation Materials

Eisen-Aluminium (Fe/Al) Evaporation Materials Description

Eisen-Aluminium (Fe/Al) Evaporation Materials consist of a blend of iron (Fe) and aluminium (Al) that is used as the feedstock for evaporation processes. Evaporation is a method applied in various domains, for example the deposition of thin layers for semiconductor devices, optical coatings and surface engineering.

Iron and aluminium are distinct metallic elements. They are combined to enhance specific material attributes. In the case of Fe/Al evaporation materials, this combination allows the deposition of thin films that demonstrate high strength, corrosion resistance and thermal stability.

Specifications for Eisen-Aluminium (Fe/Al) Evaporation Materials

Eisen-Aluminium (Fe/Al) Evaporation Materials Applications

1. Thin-film solar cells: Fe/Al layers can be employed as precursor materials in the fabrication of thin-film solar cells. These films function either as buffer layers or as absorber materials, depending on their composition and additional components.

2. Magnetic storage media: Fe/Al alloys can be utilised for magnetic storage media such as floppy disks and magnetic tapes. The thin Fe/Al layers are deposited onto substrates and subsequently treated with a magnetic field to align the magnetic domains required for data storage.

3. Wear-resistant coatings: Intermetallic FeAl compounds exhibit measured wear resistance. Consequently, they are applied in various coating applications. Depositing a thin Fe/Al film on components such as cutting tools or engine parts can extend service life and operational performance.

4. Corrosion protection: Fe/Al layers serve as protective coatings for metal surfaces. Given that they prevent the underlying metal from exposure to corrosive environments, they thereby extend the durability and lifespan of different structures.

5. Catalysis: Eisen-Aluminium catalysts can be employed in several chemical reactions, including hydrogenation, oxidation and Fischer-Tropsch synthesis. In the form of thin layers, these catalysts provide an increased surface area for reactions and demonstrate measurable catalytic activity and selectivity.

6. Microelectronics: Fe/Al films can be used in microelectronic devices such as integrated circuits and microsensors. These films act as conductive layers or interconnections that establish the electrical connection between various components, thereby ensuring efficient operation.

Eisen-Aluminium (Fe/Al) Evaporation Materials Packaging

Our Eisen-Aluminium (Fe/Al) evaporation materials are handled carefully during storage and transport in order to maintain the quality of the product in its original condition.