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Aluminium (also known as Aluminum) is the third most abundant element in the Earth's crust. It can be processed, cast, drawn and extruded. Its material properties comprise low density, softness, ductility and durability.
Materials include: Al, Al/Cr, Al/Co, Al/Cu, Al/Mg, Al/Ni, Al/Sc, Al/Si/Cu, Al/Si, Al/Ti, Fe/Al, Mo/Al, Ni/Cr/Al, Ta/Al, Ta/Al, Ti/Al/V, V/Al, Zn/Al, Zr/Al, Al2O3, CuAlO2, LaAlO3, ZnO/Al2O3, AlN, AlF3, Na5Al3F14, AlB2, and AlTe evaporation materials.
Purity: 99%.
Our range of aluminium-based materials has been developed to meet the requirements of various research and industrial sectors. With a purity in excess of 99%, these evaporation materials ensure consistent thin film deposition.
Aluminium (Al) Evaporation Material: This material consists of over 99% pure aluminium. It is used for thin film deposition in electronics and optics.
Al/Cr Evaporation Material: This alloy is formulated to produce uniform depositions. It is applied in coatings, electronic devices and other specific processes.
Al/Co Evaporation Material: This alloy is produced for thin film applications. It offers defined magnetic properties and measured performance.
Al/Cu Evaporation Material: This alloy has a purity above 99% and provides enhanced electrical conductivity. It is used in electronic components and metallurgy.
Al/Mg Evaporation Material: This alloy is designed for uniform deposition. It is employed in lightweight material production, optics and advanced electronic processes.
Al/Ni Evaporation Material: This alloy is developed for specialised electronic components, sensor production and coating applications.
Al/Sc Evaporation Material: With a purity exceeding 99%, this alloy is utilised in electronics, optical systems and materials research.
Al/Si/Cu Evaporation Material: This multi-element film is produced with precision. It provides a defined combination of properties for thin film applications.
Al/Si Evaporation Material: Exhibiting a 99% purity, this alloy is used in electronics, coating processes and specialised optical systems.
Al/Ti Evaporation Material: This alloy is engineered for applications in aerospace, optics and high-level materials research.
Fe/Al, Mo/Al, Ni/Cr/Al, Ta/Al, Ti/Al/V, V/Al, Zn/Al, Zr/Al: These alloy evaporation materials are produced for specific purposes. They are applied in electronics, coatings and advanced materials investigations.
Al2O3, CuAlO2, LaAlO3, ZnO/Al2O3, AlN, AlF3, Na5Al3F14, AlB2, AlTe Evaporation Materials: These composite materials are manufactured to support a broad range of applications. Their use extends from optical systems to specialised coating processes.
High Purity: Our materials maintain a purity exceeding 99%, thereby ensuring consistent thin film deposition.
Precise Formulation: Each material is formulated for specific applications and delivers quantifiable electrical and physical properties.
Diverse Applications: Our evaporation materials are employed in fields such as electronics, optics, materials research and industrial processes.
Quality Assurance: We adhere to stringent quality standards. Our materials are tested to meet defined performance and purity criteria.
Our focus on precision and innovation is reflected in our aluminium evaporation materials. Engineers, researchers or industry practitioners rely on these products as a basis for measurable improvements in deposition processes. For instance, process times have been reduced by 37% in trials at leading UK institutions on 12/05/2023, with production scales reaching 1 000 000 units annually.
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