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ITO0491 Indium Tin Oxide (ITO) Sputtering Targets

Catalogue Number ST0334
Material 90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
Purity >=99.99%
Density 7.1g/cm3

The ITO target produced by magnetron or alternative sputter techniques is used for ITO-coated substrates. These substrates include electrodes for flat-panel displays, touch panel contacts, energy-efficient automotive and building glass, optoelectronic devices and solar cells. Stanford Advanced Materials supplies its customers with ITO targets of various dimensions.

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United Kingdom

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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