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  • ITO0491 Indium Tin Oxide (ITO) Sputtering Targets

    • ITO0491 Indium Tin Oxide (ITO) Sputtering Targets

    Catalogue Number ST0334
    Material 90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
    Purity >=99.99%
    CAS Number 50926-11-9
    Density 7.1g/cm3
    Melting Point 1565℃

    The ITO target produced by magnetron or alternative sputter techniques is used for ITO-coated substrates. These substrates include electrodes for flat-panel displays, touch panel contacts, energy-efficient automotive and building glass, optoelectronic devices and solar cells. Stanford Advanced Materials supplies its customers with ITO targets of various dimensions.

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    LAST RECOMMENDATION

    IN0480 Indium Ingots (Ingot)
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    VD0691 Indium Iron Oxide (InFe2O4) Evaporation Materials
    VD0692 Indium Oxide (In2O3) Evaporation Materials
    VDI0693 Indium Tin Oxide (ITO) vapour deposition materials
    VDI0694 Indium-Zinc-Oxide (IZO) vapor deposition materials
    VD0818 Indium Sulphide (In2S3) Evaporation Materials

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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
      • 3''
      • 4''
      • 5''
      • 6''
      • Other
      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
      • Other
      Bonding

      Yes

      • Yes
      • No
      • Other
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