Targets from Niob-Hafnium Alloy Description
The Niob-Hafnium alloy exhibits a high melting point, effective corrosion resistance, and acceptable processability. This alloy is applicable in pharmaceutical, semiconductor, aviation, and nuclear engineering fields. Sputter targets with high purity contribute to deposition processes by ensuring consistent layer quality. Stanford Advanced Materials (SAM) specialises in manufacturing Targets aus Niob-Hafnium-Legierungen with a purity of up to 99.95%. Quality assurance procedures are implemented to confirm the product's reliability.
Niob-Hafnium Alloy Targets Specification
Surface
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Polished
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Size
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Circular targets, Diameter 10‑400 mm, Thickness 2‑28 mm
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Material
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R04295 (Nb‑10Hf), Nb‑10W‑10Hf (Niobium 10% Tungsten)
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Purity
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99.9% 99.95% 99.99%
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Niob-Hafnium Alloy Targets Application
1. Semiconductor manufacturing: Employed as sputter targets in the production of semiconductor components such as integrated circuits (ICs), transistors, and diodes.
2. Data storage: Used in the manufacture of magnetic recording media such as hard disk drives (HDDs) and magnetic tapes for high‑density data storage.
3. Optical coatings: Utilised in the deposition of thin films for optical components, lenses, mirrors, and filters. They are used in lasers, optical instruments, and telecommunication devices.
4. Solar cells: Given that they exhibit high electrical conductivity and stability, they are used in the production of thin‑film solar cells for photovoltaic applications.
Niob-Hafnium Alloy Targets Packaging
Our targets made from Niob-Hafnium alloy are handled carefully to prevent damage during storage and transport, thereby preserving the quality of the products in their original condition.