ST0982 Zirconium Sputtering Target (Zr Sputtering Target)

Introduction to Zirconium Sputtering Targets

Zirconium (Zr) is a silvery metal with a density of 6,52 g/cm3. Zr exhibits a very low neutron absorption cross‐section and a relatively high melting point (1855 °C or 3371 °F), which renders it suitable for use in nuclear fuel rods. Zirconium sponge and crystal ingots serve as the raw materials for the production of sputtering targets. Although zirconium sponge is inexpensive and of lower purity, it contains a high oxygen content. In contrast, zirconium crystal bars, while more costly, are manufactured with higher purity and are therefore utilised in sputtering target production.

Both Zr and Hf are employed in the nuclear industry. Their neutron capture characteristics differ. Consequently, even though they share many similar properties, separation is achieved using either the liquid extraction method or salt melt distillation. We offer two grades of high‐purity zirconium targets: one with a low hafnium content (250 ppm or 0,025 %) and one with a high hafnium content.

Applications of Zirconium Sputtering Targets

1. Semiconductor Manufacturing: They are used for the deposition of zirconium thin films on semiconductor substrates during the production of integrated circuits (ICs), microchips and other electronic components. Zirconium sputtering targets facilitate the deposition of thin films with precise thickness and uniformity, which are critical for device performance and reliability.

2. Optical Coatings: They are employed in the fabrication of optical coatings for lenses, mirrors and other optical components in sectors such as telecommunications, aerospace and scientific research. Thin films deposited from zirconium sputtering targets improve surface properties by enhancing reflectivity and light transmission.

3. Surface Engineering: They are applied in surface modification techniques, including the deposition of zirconium coatings designed to improve wear resistance, corrosion resistance and biocompatibility. Zirconium sputtering targets enable the deposition of thin films with tailored properties to meet specific requirements in industries such as automotive, medical and aerospace.

4. Thin-film Solar Cells: They are utilised in the manufacture of thin-film solar cells, where zirconium-based materials function as buffer layers, transparent conductive oxides or back contacts, thereby enhancing solar cell efficiency and performance. Zirconium sputtering targets are key in depositing these films with precise control over composition and thickness.

Specifications for Zirconium Sputtering Targets

Unit: %.

*Concentrations for C, N and O are not available.
*The concentrations of other metal elements are below measurable limits.

Packaging of Zirconium Sputtering Targets

Our zirconium sputtering targets are handled with care to prevent damage during storage and transport, thereby maintaining the quality of our products in their original condition.

Related Articles:

What Is Zirconium Used For? Nuclear Applications and More

Where Is Zirconium Used?

Separation of Zirconium and Hafnium

Applications of Zirconium Products