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Stanford Advanced Materials (SAM) manufactures and supplies high-purity silicon evaporation materials and various evaporation materials.
High Purity: Our silicon evaporation materials exhibit a measured purity of at least 99.9%. This purity maintains the integrity and performance of deposited thin films in varied applications.
Uniformity: Our silicon evaporation materials enable uniform thin film deposition. Coating thickness deviation remains below 2%.
Compatibility: The materials are compatible with thermal evaporation, electron-beam evaporation and sputtering methods.
Semiconductor Manufacturing: Silicon is a fundamental material in semiconductor manufacturing. Our materials are used to fabricate thin films for integrated circuits, photovoltaic devices and sensors.
Optics and Coatings: Thin silicon layers are used in optical and anti-reflective coatings, and reflective mirrors. This use reduces reflectance by 3 to 5% under standard test conditions.
Research and Development: Our materials support research in materials science, nanotechnology and surface engineering. They enable the fabrication of new structures and devices.
Precise Coating: Our technology produces thin films with a controlled thickness variation of less than 2%.
High Purity: The coatings achieve a minimum purity level of 99.9%.
Versatility: The materials apply to various thin-film processes in electronics, optics and materials research.
Catalyst for Innovation: They support new technology development. Processing time reduces by up to 20%.
Expertise: Our institution has over 25 years of experience in thin-film technology. This experience is verified in peer-reviewed studies.
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