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CY3439 Ag-plated Silicon Wafer (Ag/Cr Coated SiO2/Si Substrate)

Catalogue Number CY3439
Composition Ag, Cr, SiO2, Si
Coating thickness Cr 2-7nm Ag 50nm
Dimensions 4”, 50mm, 100mm Dia, or customized
Thickness 0.525mm, 0.279mm
Polishing One side polished

Ag/Cr-coated SiO2/Si substrate can be employed in the nanoregion, in Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and other scanning probe microscopy techniques. Stanford Advanced Materials (SAM) possesses extensive experience in the manufacture and supply of high-quality optical products.

Related products: Aluminium Film on Silicon Wafer, Au/Ti coated SiO2/Si substrate, Au/Cr coated SiO2/Si substrate, Pt coated SiO2/Si substrate

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