Description of Hafnium-Silicid Vapourisation Materials
Stanford Advanced Materials offers a Hafnium-Silicid vapourisation material with the chemical formula HfSi2. This material is a silicide–ceramic vapourisation agent. It ensures the deposition of layers with high precision given that deposition processes require exacting material properties. Stanford Advanced Materials (SAM) specialises in the production of vapourisation materials with a purity up to 99.9995%, which is maintained by strict quality assurance measures.
Specifications of Hafnium-Silicid Vapourisation Materials
Specification |
Description |
Material Type |
Hafnium(IV) Silicate |
Symbol |
HfSi2 |
Appearance/Colour |
Tetragonal crystal |
Melting Point |
2 758 °C (4 996 °F; 3.031 K) |
Density |
7.0 g/cm³ |
Purity |
99.5% |
Available Forms |
Powder, Granulate, Customised forms |
Applications of Hafnium-Silicid Vapourisation Materials
Hafnium-Silicid vapourisation materials are used in various deposition processes. They are applied in semiconductor deposition, chemical vapour deposition (CVD) and physical vapour deposition (PVD). Their use in the optical field includes wear protection, decorative coatings and display technology developments.
Packaging of Hafnium-Silicid Vapourisation Materials
Stanford Advanced Materials (SAM) attaches great importance to the efficient identification and quality control of its Hafnium-Silicid vapourisation materials. The materials are carefully labelled and externally marked to prevent damage during storage or transport.