We supply hafnium oxide (HfO2) evaporation materials in various forms. Customised forms are available on request. Stanford Advanced Materials (SAM) produces high-purity hafnium oxide evaporation materials and a range of other evaporation materials.
Hafnium Oxide (HfO2) evaporation materials are used in thin film deposition processes to produce coatings with adjustable electrical, optical or dielectric properties. HfO2 layers exhibit a high dielectric constant, thermal stability and a wide band gap. They are employed in semiconductor manufacturing, particularly for gate dielectric applications in modern CMOS transistors. In addition, Hafnium Oxide films are utilised in optical coatings, high‑k dielectrics and capacitor applications, thereby contributing to progress in electronics, optics and nanotechnology.
Used in Hafnium Oxide thin film deposition processes, including semiconductor deposition, chemical vapour deposition (CVD) and physical vapour deposition (PVD).
Employed in optics, including wear protection, decorative coatings and displays.
Our Hafnium Oxide (HfO2) evaporation materials are carefully managed to avoid damage during storage and transport, thereby maintaining product quality in its original state.
Send us an inquiry today to learn more and receive the latest pricing. Thank you!
Leave A Message
Leave A Message
Please fill in your RFQ details and one of sales engineers will get back to you within 24 hours. If you have any questions, You can call us at 949-407-8904 (PST 8am to 5pm).