AL10244 Sapphire Wafer Al2O3 C-plane (0001) 0.5 inch x 0.5 inch x 1.0 mm

Sapphire Wafer Al2O3 C-plane (0001) 0.5 inch X 0.5 inch x 1.0 mm Description

Sapphire Wafer Al2O3 C-plane (0001) 0.5 inch X 0.5 inch x 1.0 mm is manufactured from aluminium oxide (Al2O3) with a C-plane (0001) crystallographic orientation. The wafer measures 0.5 inches by 1.0 mm in thickness, ensuring compatibility with standard semiconductor processing equipment. Its surface flatness and low defect density contribute to improved process uniformity in microelectronic fabrication and optical applications.

Sapphire Wafer Al2O3 C-plane (0001) 0.5 inch X 0.5 inch x 1.0 mm Applications

1.       Electronics and Semiconductor Manufacturing
   - Used as a substrate in integrated circuit fabrication to achieve a flat interface by leveraging its controlled C-plane orientation.
   - Applied in thin-film deposition processes to reduce scattering losses through its low defect density.

2.       Optoelectronic Devices
   - Serves as a window in LED production to enhance light extraction by utilising its high optical transparency.
   - Frequently used in sensor applications to enable stable signal conversion by ensuring uniform material properties.

Sapphire Wafer Al2O3 C-plane (0001) 0.5 inch X 0.5 inch x 1.0 mm Packing

The wafer is packaged in a cushioned anti-static tray inside a sealed moisture barrier bag to prevent contamination and physical damage. Packaging also includes foam inserts and rigid protective cartons. Storage guidelines recommend a dry, temperature-controlled environment to maintain material properties. Custom packaging options, including labelled compartments and vibration-resistant supports, are available upon request.

Frequently Asked Questions

Q1: How is the wafer’s surface flatness and defect density verified?
A1: Surface characteristics are routinely verified using atomic force microscopy (AFM) and scanning electron microscopy (SEM). These evaluations help ensure that the wafer meets the flatness and low defect requirements necessary for semiconductor processing.

Q2: What are the recommended storage conditions for this sapphire wafer?
A2: The wafer should be stored in a temperature-controlled, dry environment to avoid moisture absorption and physical stress. Anti-static packaging and vibration-free handling are advised to preserve the wafer’s structural integrity.

Q3: Can the dimensions or orientation of the wafer be customised?
A3: Customisation options may be available based on production capabilities. Specific requests regarding wafer dimensions or alternative crystallographic orientations should be discussed with SAM’s technical team to determine feasibility and impact on material properties.

Additional Information

Sapphire substrates made from Al2O3 are fundamental in microelectronic and optoelectronic fields due to their high thermal stability and chemical inertness. The C-plane orientation is particularly valued in applications where uniform surface conditions are critical for film deposition and device performance.

Materials scientists frequently study the crystallographic properties of sapphire to enhance substrate performance. Ongoing research focuses on reducing defect densities and improving surface quality, which in turn benefits applications ranging from high-frequency electronics to advanced sensor technologies.