AL10271 Sapphire Wafer Al2O3 A plane (11-20) 0.25 inch x 0.25 inch x 0.5 mm

Sapphire Wafer Al2O3 A plane (11-20) 0.25 inch x 0.25 inch x 0.5 mm Description

Sapphire Wafer Al2O3 A plane (11-20) 0.25 inch x 0.25 inch x 0.5 mm is fabricated from high-purity aluminium oxide (Al2O3) produced with precise control over the A plane orientation. Its dimensions ensure compatibility with standard processing equipment used in semiconductor and optical device manufacturing. The crystallographic A plane (11-20) orientation is crucial for applications that require controlled surface properties and dimensional stability.

Sapphire Wafer Al2O3 A plane (11-20) 0.25 inch x 0.25 inch x 0.5 mm Applications

1.       Electronics and Semiconductor Processing
   - Used as a substrate in thin-film deposition systems to achieve uniform film growth by leveraging its well-defined crystalline surface.
   - Applied as a base for microelectronic components to maintain dimensional stability during high-temperature processing.

2.       Optoelectronics and Sensor Fabrication
   - Serves as a platform in LED manufacturing to enhance light extraction efficiency by utilising its smooth, crystalline surface.
   - Used in sensor applications to provide a chemically inert barrier that preserves signal integrity under varying environmental conditions.

Sapphire Wafer Al2O3 A plane (11-20) 0.25 inch x 0.25 inch x 0.5 mm Packing

The wafer is packed in a clean, anti-static container lined with foam to mitigate mechanical shocks. It is secured in individual compartments to prevent cross-contamination. Storage recommendations include a dry, temperature-stable environment with minimal exposure to particulate matter. Custom packaging options with additional cushioning and labeling are available to meet specific handling and storage protocols.

Frequently Asked Questions

Q1: How is the crystallographic orientation verified in these wafers?
A1: Quality control is achieved via scanning electron microscopy and X-ray diffraction. These methods confirm the A plane (11-20) orientation and verify the absence of significant surface defects, ensuring dimensional consistency.

Q2: What are the critical handling conditions required for these substrates?
A2: The wafers must be handled in cleanroom environments with anti-static precautions. They should be stored in dry, temperature-controlled settings to avoid surface contamination and mechanical stresses.

Q3: Can these wafers be integrated into standard semiconductor processing equipment?
A3: Yes, the dimensions and material consistency of these wafers ensure compatibility with standard semiconductor fabrication tools, enabling integration into established process flows without significant modifications.

Additional Information

Sapphire, or crystalline Al2O3, is an essential material in advanced electronic and optical applications due to its chemical stability and excellent mechanical properties. Its thermal conductivity and electrical insulation characteristics make it suitable for high-temperature and high-frequency applications. Understanding the interplay between crystallographic orientation and material properties is critical in optimising device performance in research and industrial settings.
Studies in materials science emphasise the significance of crystal orientation control, which directly impacts surface properties and processing outcomes in semiconductor and optoelectronic manufacturing.