CY8292 Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm Description

Engineered from premium-grade Al2O3 (Aluminium Oxide), our single crystal sapphire substrate is precisely oriented along the C-plane (0001) to guarantee optimal performance and stability. With dimensions of 5 x 5 x 0.5 mm, this substrate offers exceptional mechanical strength, excellent thermal conductivity, and a high dielectric constant, making it ideal for advanced semiconductor and optoelectronic applications.

Each wafer undergoes stringent quality control measures to ensure minimal surface defects and industry-leading flatness. The result is a uniform platform that supports high-precision epitaxial layer growth while reducing stress-related issues. Whether for LED manufacturing, laser optics, or high-frequency electronic devices, our sapphire substrate consistently delivers performance, reliability, and longevity for future technologies.

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm Applications

Aluminium Oxide Sapphire Crystal Substrate, also known as Al2O3 C-plane substrate, owes its popularity to its superior hardness, excellent thermal conductivity, and remarkable optical clarity. This 5 x 5 x 0.5 mm version offers consistent surface quality, making it a preferred choice for high-end electronic components, laser systems, and optical devices. Its low dielectric loss and stable chemical structure also facilitate research in various scientific fields, expanding applications across multiple industries.

1. Industrial Applications

·         High-temperature furnace linings: The substrate’s thermal stability and chemical resistance make it suitable for furnace components in demanding industrial environments.

·         Durable laser diode base: Its hardness and ability to withstand high heat ensures reliable operation of laser diodes in mass-production settings.

2. Research Applications

·         Thin-film experimentation: The sapphire’s well-defined crystallographic orientation enhances the growth and analysis of advanced thin films in materials science research.

·         Ion beam implantation studies: Its low dielectric loss and high purity support precise ion beam experiments, enabling accurate doping and defect investigation.

3. Commercial Applications

·         Optical windows and lenses: Optical clarity makes it suitable for use in lasers, observation systems, and specialised imaging devices.

·         Protective watch crystals: The sapphire’s scratch resistance and durability increase the product lifespan in luxury consumer devices.

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm Packaging

These aluminium oxide sapphire crystal substrates, dimensioned at 5 x 5 x 0.5 mm, are meticulously packaged in sealed, anti-static containers. Each substrate is cushioned with acid-free foam and vacuum-sealed in moisture-resistant pouches to prevent contamination. The packaging includes humidity-absorbing desiccants to maintain dryness and reduce risk. Store them in a cool, dust-free environment away from direct sunlight. Customisable packaging sizes, sealing methods, and labelling options are available to meet specific handling and logistical requirements.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm FAQs

Q1: What are the key material properties of Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm?

A1: Aluminium Oxide (Al2O3) sapphire substrates are renowned for their exceptional hardness (Mohs 9), high thermal stability, and strong chemical resistance. The C-plane (0001) orientation provides well-defined atomic planes essential for epitaxial growth. With a low dielectric constant and high electrical insulating properties, these substrates exhibit minimal lattice mismatch for many compound semiconductors, promoting film quality and enabling advanced device performance.

Q2: How should this product be handled and stored?

A2: To prevent contamination and mechanical damage, always wear cleanroom gloves and handle sapphire substrates with non-metal tweezers or other appropriate tooling. Store them in a controlled environment with stable temperature and humidity, typically in anti-static or vacuum-sealed packaging. Avoid abrasive surfaces and keep them away from harsh chemicals. Proper labelling and inventory management ensure traceability and maintain substrate integrity for further processing.

Q3: Which quality standards and certifications apply to Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm?

A3: Most reputable suppliers produce these sapphire substrates under ISO 9001-certified quality management systems, ensuring consistent manufacturing and rigorous process control. They often comply with RoHS and REACH directives, verifying the absence of hazardous substances. Additionally, products may follow SEMI specifications for wafer dimensional accuracy and flatness, as well as ASTM standards for material purity and crystallographic orientation. Certificates of Conformance typically accompany each batch.

Related Information

1. Manufacturing Process

Meticulous precision governs the manufacturing process of the Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm. Each substrate begins as a high-purity alumina feedstock, which undergoes a controlled crystal growth procedure known as the Czochralski method. Throughout this approach, master growers continuously monitor melt temperatures and crystal pulling speeds to ensure consistent lattice structure and top-tier crystal clarity. Once the crystalline boule is formed, it is carefully sliced into thin wafers with diamond-tipped saws, maintaining pristine surfaces that minimise defects. The resulting wafers are then polished using an extensive multi-step process to achieve superior flatness and optical transparency.

Thorough inspection processes follow the slicing and polishing phases, guaranteeing that each 5 x 5 x 0.5 mm substrate adheres to strict dimensional tolerances. Specialised metrology tools, such as interferometers and X-ray diffraction equipment, analyse the crystal orientation, verifying the C-plane (0001) alignment. These controlled steps help ensure the substrate’s uniform lattice arrangement—critical for subsequent deposition processes or epitaxial growth. Through this refined methodology, manufacturers can reliably produce substrates with stable mechanical strength and thermal endurance, making them an ideal foundation for high-performance applications.

2. Applications in Advanced Industries

Advanced semiconductor manufacturing often relies on Aluminium Oxide Sapphire Crystal Substrate, Al2O3 C-Plane (0001) 5 x 5 x 0.5 mm wafers for high-frequency and high-power devices. Because sapphire boasts remarkable thermal conductivity and electrical insulation, it forms an excellent platform for developing gallium nitride (GaN) and other wide bandgap materials essential in power electronics. Its structure and corrosion resistance further ensure that delicate components can withstand the demanding conditions of high-voltage and high-current operations without compromising performance or longevity.

Radiation-hard electronics also utilise sapphire substrates for aerospace and military applications where extreme radiation environments are a concern. The stable crystal orientation and minimal defect density allow these substrates to maintain operational reliability under harsh cosmic conditions. Meanwhile, the material’s ability to resist chemical wear, combined with its optical clarity, makes it equally valuable for optical devices ranging from UV detectors to solid-state lasers. These distinct advantages, paired with the 5 x 5 x 0.5 mm form factor, highlight the importance of sapphire substrates in advanced industrial sectors.