CY8301 Aluminium Oxide Sapphire Crystal Substrate, Al2O3 R-Plane (1-102) 5 x 5 x 0.5 mm

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 R-Plane (1-102) 5 x 5 x 0.5 mm  Description

Our Aluminium Oxide Sapphire Crystal Substrate (Al₂O₃) in the R-plane (1-102) configuration offers exceptional rigidity, thermal stability, and optical clarity. Measuring 5 x 5 x 0.5 mm, this substrate ensures a uniform crystal structure that optimises device performance in both research and production environments. With an excellent dielectric constant and high corrosion resistance, it is ideal for high-temperature applications and harsh operating conditions.

Diligently manufactured to stringent quality standards, each substrate exhibits precise thickness control and minimal surface defects, ensuring consistent results from batch to batch. The R-plane orientation provides unique lattice characteristics beneficial in epitaxial growth processes for LEDs, lasers, and other optoelectronic components. Choose our sapphire crystal substrate for its proven reliability, enabling you to confidently develop advanced technology.

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 R-Plane (1-102) 5 x 5 x 0.5 mm  Applications

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 R-plane (1-102) measuring 5 x 5 x 0.5 mm, offers exceptional mechanical strength, thermal stability, and optical clarity, making it indispensable across numerous fields. Its authoritative role in advanced material application stems from its low dielectric loss, high thermal conductivity, and chemical inertness. Below are just a few potential uses for this robust and versatile substrate.

1. Industrial Applications

·         Wafer-level packaging: The R-plane sapphire substrate’s excellent thermal and mechanical properties enable stable wafer bonding processes in microelectronics.

·         High-intensity LED production: Its optical clarity and high temperature tolerance provide efficient heat dissipation and improved device longevity.

2. Research Applications

·         Heteroepitaxial growth trials: The unique lattice structure supports the growth of various compound semiconductors, fostering the development of new materials.

·         Quantum computing prototypes: Low dielectric loss and chemical stability open avenues for circuit resonators in quantum bits.

3. Commercial Applications

·         Laser-compatible optics: Exceptional transparency and durability make these substrates perfect for advanced optical devices in consumer products.

·         Protective surfaces: Superior scratch resistance and hardness improve product lifespan, particularly in premium handheld electronics.

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 R-Plane (1-102) 5 x 5 x 0.5 mm  Packaging

Each Aluminium Oxide Sapphire Crystal Substrate is packaged in a protective clamshell container lined with foam, securing it against physical damage. The substrates are sealed in anti-static bags to minimise contamination. They should be stored in a clean, humidity-controlled environment below 40% RH. Additional filtration layers ensure minimal particulate exposure. From thickness variations to custom shapes, multiple customisation options are available to meet specific project requirements.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Aluminium Oxide Sapphire Crystal Substrate, Al2O3 R-Plane (1-102) 5 x 5 x 0.5 mm  FAQs

Q1: What are the key material properties of Aluminium Oxide Sapphire Crystal Substrate, Al2O3 R-Plane (1-102) 5 x 5 x 0.5 mm ?

A1: Aluminium Oxide Sapphire (Al2O3) R-plane substrates feature excellent mechanical strength and chemical stability. With a hardness of 9 on the Mohs scale, they resist scratching and withstand high temperatures up to 2000°C. Boasting good thermal conductivity (approximately 30 W/mK) and low dielectric loss, they also exhibit high optical transparency in the IR, visible, and UV ranges. These properties make them ideal for optoelectronic applications.

Q2: How should this product be handled and stored?

A2: To ensure safe handling, always wear powder-free gloves and use clean tweezers when manipulating the substrate. Avoid direct contact with the surface to minimise contamination and scratches. Store each substrate in a dedicated wafer carrier or protective container, away from moisture and dust. Maintain a stable temperature environment to prevent thermal shock. Regularly inspect and clean the substrate as required to maintain performance.

Q3: Which quality standards and certifications apply to Aluminium Oxide Sapphire Crystal Substrate, Al2O3 R-Plane (1-102) 5 x 5 x 0.5 mm ?

A3: These substrates typically comply with strict industry benchmarks such as ISO 9001 for quality management and ISO 14001 for environmental responsibility. Suppliers often perform rigorous optical and crystallographic inspections, including surface roughness measurements, x-ray diffraction analysis, and orientation verification. Batch-level certifications are issued detailing purity, crystal orientation, and defect density. Such standards ensure consistent performance for demanding optoelectronic and semiconductor applications.

Related Information

1. Material Properties and Advantages

Tailored from high-purity aluminium oxide, the Al2O3 R-Plane (1-102) sapphire crystal substrate measures 5 x 5 x 0.5 mm and ensures an exceptionally uniform surface finish. This specific orientation yields a stable crystallographic structure that withstands high-temperature processes, making it particularly well-suited for complex epitaxial growth.

Another notable advantage of this R-plane substrate is its excellent thermal conductivity, enabling effective heat dissipation during demanding applications. Its low dielectric loss, combined with superior mechanical strength, supports the integration of delicate semiconductor layers while retaining the necessary rigidity for sophisticated device fabrication.

2. Applications in Advanced Industries

Widely utilised in the production of high-performance optoelectronic devices, this 5 x 5 x 0.5 mm sapphire crystal substrate finds broad acceptance in cutting-edge research establishments. For instance, the R-plane orientation paves the way for the development of specialised laser diodes, sensor arrays, and integrated optical circuits.

Equally crucial is its contribution to aerospace and defence systems, where robust materials are essential for extreme environmental conditions. By providing steadiness in harsh surroundings, the Al2O3 R-plane substrate enables innovative development of advanced targeting systems, sensors, and rugged components that require exceptional thermal and mechanical stability.