CY8539 Silicon (Si) Crystal Substrate (100) 10x10 mm

Silicon (Si) Crystal Substrate (100) 10x10 mm Description

Our Silicon (Si) Crystal Substrate (100) 10×10 mm provides high material purity and crystalline perfection, making it an ideal basis for advanced semiconductor research and device fabrication. Cut with precision to the (100) orientation, this substrate demonstrates low surface roughness and high uniformity, essential for achieving consistent layer deposition and etching results. Its excellent electrical properties and thermal conductivity ensure optimal performance in both conventional and advanced electronics applications.

Manufactured under strict quality standards, each substrate undergoes thorough inspection to maintain tighter tolerances on thickness, resistivity, and surface flatness. This focus on precision and reliability enables researchers and engineers to develop innovative solutions in microelectronics, photonics, and other high-tech fields. Whether for prototyping or large-scale production, our Si (100) substrate meets the industry’s most demanding requirements.

Silicon (Si) Crystal Substrate (100) 10x10 mm Applications

Silicon (Si) Crystal Substrate (100) 10x10 mm is a vital platform for various high-precision technologies. Its well-defined crystalline orientation, superior thermal conductivity, and uniform surface quality support advanced microfabrication, enabling precise device performance. This substrate’s unique properties also guarantee minimal defects and excellent durability, making it indispensable in industrial, research, and commercial sectors, where accuracy and reliability are crucial for developing advanced products.

1. Industrial Applications

·         Application 1: Use in microelectromechanical systems (MEMS) fabrication, leveraging the substrate’s crystallographic consistency for high-precision device production

·         Application 2: Integration into semiconductor manufacturing processes, ensuring stable performance under high temperatures and demanding conditions

2. Research Applications

·         Application 1: Basis for nanotechnology experiments that require a defect-free surface, crucial for reproducible outcomes

·         Application 2: Development of advanced sensor prototypes, harnessing the substrate’s intrinsic properties for accurate data collection

3. Commercial Applications

·         Application 1: High-density packaging in consumer electronics, benefitting from uniform thickness and excellent conduction properties

·         Application 2: Fabrication of optical components for display technology, taking advantage of minimal surface roughness for superior clarity

Silicon (Si) Crystal Substrate (100) 10x10 mm Packaging

Each 10x10 mm Silicon (Si) Crystal Substrate is placed in an anti-static, cushioned holder, ensuring maximum shock absorption. This holder is then vacuum-sealed in a cleanroom-grade pouch to prevent dust infiltration. To maintain purity, the sealed package should be stored in a dry, controlled environment. Additional anti-contamination measures include use of gloves and laminar flow benches during handling. Customized packaging solutions, like wafer carriers or multi-layer inserts, are available on request.

Packaging: Vacuum sealed, Wooden Box, or Customized.

Silicon (Si) Crystal Substrate (100) 10x10 mm FAQs

Q1: What are the key material properties of Silicon (Si) Crystal Substrate (100) 10x10 mm?

A1: Silicon (Si) Crystal Substrate (100) 10x10 mm typically has a cubic crystal structure with a (100) orientation, high purity, and a low level of defects. Its thermal conductivity is approximately 150 W/mK at 300 K, and it features an energy band gap of about 1.12 eV. This substrate provides excellent mechanical strength, chemical stability, and uniform thickness for advanced electronic and photonic applications.

Q2: How should this product be handled and stored?

A2: To maintain substrate integrity, handle each piece using clean, lint-free gloves or tweezers to avoid contamination and surface damage. Store the substrates in ambient conditions with minimal humidity, ideally using protective wafer boxes or padded containers. Avoid exposure to harsh chemicals or rapid temperature fluctuations, as this can induce stress or defects. Inspect periodically for contamination or chips, and maintain careful labeling for traceability and inventory control.

Q3: Which quality standards and certifications apply to Silicon (Si) Crystal Substrate (100) 10x10 mm?

A3: These silicon substrates typically comply with SEMI (Semiconductor Equipment and Materials International) standards for wafer thickness, flatness, and orientation accuracy. They may carry ISO 9001 certifications, indicating strict quality management processes. Metrology verifications, such as X-ray diffraction (XRD) to confirm crystal orientation and reflectivity measurements, ensure substrate consistency. Surface morphology and defect inspections are conducted per industry specifications. Comprehensive documentation often accompanies each batch to authenticate traceability and production standards.

Related Information

1. Material Properties and Advantages

Manufactured from ultrapure silicon, the (100) 10x10 mm wafer offers an exceptionally smooth surface that is optimal for high-precision microelectronic devices. This substrate boasts a crystal orientation of (100), which ensures uniform electrical and thermal characteristics across its square dimension, aiding in consistent performance and reduced defect levels.

Chosen for its excellent thermal conductivity, this silicon crystal substrate can efficiently disperse heat and maintain structural stability during complex fabrication steps. Its high purity level reduces contamination risks, making it an ideal choice in applications where product reliability and accurate signal flow are critical.

2. Applications in Advanced Industries

Shielding critical microelectronic circuits from interference, the (100) 10x10 mm silicon substrate plays a pivotal role in aerospace, automotive, and medical device manufacturing. This crystal wafer supports the development of miniaturised sensors, precision transducers, and specialised optoelectronic components, enabling advanced solutions that must endure harsh operating environments.

Research activities in semiconductor research rely on these highly standardised wafers to produce next-generation integrated circuits and photonic components. With their consistent lattice structure and excellent long-term reliability, these silicon substrates help drive breakthroughs in quantum computing, advanced imaging systems, and other frontier technologies requiring uncompromised performance.