CY9468 Nickel Single Crystal Substrate Ni Substrate (100), 10x10x1 mm, SSP

Nickel Single Crystal Substrate Ni Substrate (100), 10x10x1 mm, SSP Description

Nickel Single Crystal Substrate Ni Substrate (100), 10x10x1 mm, SSP is a nickel-based substrate with a defined (100) orientation. Its dimensions support standard semiconductor process requirements. The single crystal structure minimises grain boundaries, reducing scattering effects and ensuring consistent electrical behaviour. This precise structure benefits applications requiring controlled crystallinity and material uniformity in advanced fabrication processes.

Nickel Single Crystal Substrate Ni Substrate (100), 10x10x1 mm, SSP Applications

Electronics
- Used as a substrate in epitaxial film deposition to achieve uniform layer growth by leveraging the (100) surface orientation, ensuring consistent electrical properties.
- Applied as a standard in calibration for metallurgical studies to optimise analysis accuracy by leveraging its high-purity single crystal structure.

Research and Development
- Serves as a platform in material property research to evaluate crystallographic impacts on device performance by leveraging minimal defect density.

Industrial Applications
- Frequently used in microelectronic packaging to enhance thermal management by leveraging consistent substrate dimensions and material properties.

Nickel Single Crystal Substrate Ni Substrate (100), 10x10x1 mm, SSP Packing

The substrate is individually secured in anti-static packaging and cushioned within sealed containers to prevent mechanical damage and contamination. Packaging supports stable temperature conditions and minimises moisture exposure during transit. Protective wrapping and custom labeling options help meet specific handling protocols. Optional vacuum-sealing can be arranged for additional protection in sensitive applications.

Frequently Asked Questions

Q1: What is the significance of the (100) orientation in this substrate?
A1: The (100) orientation promotes uniform crystal properties and minimises defect density, which is essential for consistent film growth and reduces interfacial stresses during device fabrication processes.

Q2: How does the substrate’s 10x10x1 mm size affect semiconductor processing?
A2: The standardised dimensions ensure compatibility with existing semiconductor processing equipment, reducing variability during deposition and lithography. This uniformity facilitates reproducible experimental and manufacturing outcomes.

Q3: What quality control measures are applied during production?
A3: SAM utilises high-resolution SEM and X-ray diffraction to assess crystallographic alignment and surface integrity. These measures confirm that each substrate meets the strict dimensional and purity standards required for advanced fabrication.

Additional Information

Nickel single crystal substrates play a significant role in both academic research and industrial production due to their accurate crystallographic control and consistent material properties. These substrates provide a reliable platform for the analysis and development of semiconductor devices, where minimal defects and consistent orientation are critical.

The detailed control over crystal structure allows for precise investigations into material behaviours at micro and nanoscale levels. As a result, these substrates not only support advanced device fabrication but also contribute to the broader understanding of material science principles in fields that require high-definition electronic components.