CY9470 Nickel Single Crystal Substrate Ni Substrate (110), 10x10x0.5 mm, SSP

Nickel Single Crystal Substrate Ni Substrate (110), 10x10x0.5 mm, SSP Description

Nickel Single Crystal Substrate Ni Substrate (110), 10x10x0.5 mm, SSP provides a well-defined single crystal structure of nickel with a (110) orientation, ensuring a uniform lattice essential for epitaxial growth. The substrate's dimensions of 10 mm by 10 mm with a 0.5 mm thickness allow integration with standard processing equipment. Its minimal defect density and consistent surface finish enhance its suitability for applications in advanced materials research and semiconductor processing.

Nickel Single Crystal Substrate Ni Substrate (110), 10x10x0.5 mm, SSP Applications

Electronics and Semiconductor Processing
- Used as a substrate in thin-film deposition systems to achieve uniform epitaxial layers by leveraging its precise (110) orientation.
- Applied as a diffusion barrier in integrated circuits to enhance device performance through consistent grain structures.

Materials Research and Laboratory Analysis
- Serves as a calibration standard in crystallographic experiments to validate deposition techniques and surface treatments by capitalising on its low defect density.

Nickel Single Crystal Substrate Ni Substrate (110), 10x10x0.5 mm, SSP Packing

The substrate is individually secured in an anti-static pouch and cushioned container to prevent mechanical damage and contamination. It is stored in a dry, temperature-controlled environment with low humidity to maintain its precise surface conditions. Custom packaging options, including additional foam inserts and labeling, are available to accommodate specific handling and storage protocols.

Frequently Asked Questions

Q1: How does the (110) orientation benefit epitaxial growth processes?
A1: The (110) orientation offers a uniform crystalline template that facilitates consistent epitaxial layer growth, reducing film defects and improving adhesion critical in semiconductor fabrication.

Q2: What quality control methods are used to ensure the substrate’s precision?
A2: Stanford Advanced Materials (SAM) employs X-ray diffraction to verify crystallographic alignment and atomic force microscopy to assess surface roughness, ensuring the substrate adheres to stringent defect density and dimensional tolerances.

Q3: Can the substrate be customised to meet specific research requirements?
A3: Yes, adjustments in dimensions or additional surface treatments can be arranged through technical consultations, allowing customisation to cater to specialised experimental setups.

Additional Information

Nickel substrates play a significant role in materials science due to their ability to support high-quality epitaxial film growth. The crystallographic precision of these substrates directly influences the performance and reproducibility of thin-film devices. Research in this field often focuses on understanding how substrate properties like grain orientation and surface uniformity affect overall process efficiencies.

The application of single crystal nickel substrates extends to various experimental techniques in semiconductor and materials engineering. The controlled environment during production and subsequent quality verification ensures that these substrates provide a reliable platform for advanced research, contributing to improved deposition processes and enhanced device performance.