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  • ST11468 Nickel Molybdenum Planar Target, NiMo Target

    • ST11468 Nickel Molybdenum Planar Target, NiMo Target

    Catalogue Number ST11468
    Composition NiMo
    Shape Rectangular
    Form Target
    Purity Ni+Mo: ≥99%

    Nickel Molybdenum Planar Target, NiMo Target is manufactured from a refined nickel-molybdenum alloy with a flat geometry, essential for controlled sputtering deposition. Stanford Advanced Materials (SAM) implements targeted material characterisation including X-ray diffraction and electron microscopy to verify compositional integrity and surface uniformity. The target supports precise thin film applications by delivering consistent erosion behaviour during sputtering.

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    FAQ

    How does the NiMo composition affect sputtering performance?

    The NiMo alloy offers predictable erosion rates and uniform deposition profiles. This consistency assists in achieving controlled film thickness and reduces target poisoning issues during both RF and DC sputtering processes.

    What benefits does the planar design offer in deposition processes?

    The planar configuration enhances plasma uniformity across the target surface, resulting in even film deposition. This design minimises edge effects and ensures a consistent coating profile on substrates.

    Which quality control methods are applied during target production?

    Quality assurance includes electron microscopy and spectrometric analysis to verify surface uniformity and compositional accuracy. These methods confirm that each target meets stringent criteria for dimensional precision and surface integrity.

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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
      • 3''
      • 4''
      • 5''
      • 6''
      • Other
      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
      • Other
      Bonding

      Yes

      • Yes
      • No
      • Other
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