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ST11470 Nickel Cobalt Iron Planar Sputtering Target (NiCoFe)

Catalogue Number ST11470
Composition NiCoFe
Shape Rectangular
Form Target
Purity Ni+Co+Fe: ≥99%

Nickel Cobalt Iron Planar Target, NiCoFe Target is produced using a controlled alloy composition suitable for sputtering deposition processes. Stanford Advanced Materials (SAM) utilises advanced surface analysis techniques such as X-ray diffraction and scanning electron microscopy to monitor material uniformity and flatness throughout manufacturing. This approach minimises defects by adhering to stringent in‑process inspection protocols, thereby ensuring a controlled and uniform target surface for film deposition applications.

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Description
Specification
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FAQ

What deposition parameters are recommended when using this NiCoFe Target?

Adjust process power and gas flow to suit the sputtering system. Higher power density accelerates the deposition rate, while controlled argon pressure maintains a uniform film. Contact us for tailored process guidelines.

How does the alloy composition of NiCoFe affect film uniformity?

The controlled NiCoFe composition ensures uniform ion bombardment during deposition. This helps produce films with consistent microstructural properties, reducing contamination risks and enhancing film homogeneity.

Is the target compatible with standard sputtering equipment?

Yes, the planar geometry and standardised dimensions of the NiCoFe Target ensure compatibility with typical sputtering system setups. Process adjustments may be required to optimise deposition outcomes.

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United Kingdom

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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