ST7951 Molybdenum Sputtering Target 99.95%, Dia. 2 inch

Molybdenum Sputtering Target 99.95%, Dia. 2 inch Description

Our Molybdenum Sputtering Target features a high purity of 99.95% (Mo) and a precise diameter of 2 inches, making it suitable for thin film deposition and other coating applications. Thanks to molybdenum’s high melting point and exceptional thermal conductivity, this target endures extreme temperatures while maintaining reliable performance. Its inherent corrosion resistance additionally ensures stability in demanding environments, contributing to extended operational life and consistent film quality.

Stringent quality standards govern every stage of the manufacturing process, from raw material sourcing to final inspection. Each target undergoes rigorous testing to guarantee uniform microstructure, optimal density, and minimal impurities. As a result, researchers and industrial operators can depend on our Molybdenum Sputtering Target for reproducible results and improved deposition efficiency in advanced PVD processes.

Molybdenum Sputtering Target 99.95%, Dia. 2 inch Applications

Molybdenum Sputtering Target 99.95%, Dia. 2 inch is widely recognised for its excellent thermal conductivity, superior mechanical strength, and high melting point. These attributes enable reliable performance in harsh environments, making it ideal for various applications. From thin film coatings to semiconductor components and optical layers, molybdenum’s properties support consistent quality and enhanced device functionality.

1. Thin Film Deposition Applications

·         PVD Coating: Molybdenum’s high melting point ensures stable deposition and excellent adhesion for protective layers and decorative finishes.

·         Magnetron Sputtering: Its mechanical stability delivers precise, uniform films in vacuum environments with reduced contamination.

2. Semiconductor Applications

·         Integrated Circuits: Molybdenum’s conductivity and temperature resilience enable reliable interconnects and improved device longevity.

·         Electronic Components: Its corrosion resistance and minimal impurity content ensure stable, high-performance electronic parts.

3. Optical Coating Applications

·         Anti-reflective Coatings: Molybdenum’s strong bonding characteristics and low scattering loss enhance optical clarity and durability.

·         Mirror Coatings: Its uniform, reflective layers improve energy efficiency and performance in high-temperature optical systems.

Molybdenum Sputtering Target 99.95%, Dia. 2 inch Packaging

Each Molybdenum Sputtering Target is carefully sealed in a vacuum-packed enclosure to guard against moisture and oxidation. A layer of shock-absorbing foam or bubble wrap offers extra protection during transit. Anti-oxidation measures, such as inert gas flushing, help preserve surface purity. For larger orders or unique requirements, packaging can be customised with extra cushioning or double-sealed pouches, ensuring your target arrives undamaged and ready for high-performance applications.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Molybdenum Sputtering Target 99.95%, Dia. 2 inch FAQs

Q1: What are the key material properties of Molybdenum Sputtering Target 99.95%, Dia. 2 inch?

A1: This high-purity molybdenum target exhibits excellent thermal conductivity, low thermal expansion, and high melting point (around 2,623°C). Its density of approximately 10.2 g/cm³ and hardness ensure exceptional wear resistance, while the 99.95% purity minimises contamination during sputtering. Moreover, the fine-grained microstructure offers superior mechanical stability. These properties make it particularly suited to demanding thin-film applications requiring precise and reliable molybdenum coatings.

Q2: How can this Mo sputtering target be processed or fabricated?

A2: Fabrication starts with vacuum melting or powder metallurgy to refine the material to 99.95% purity. The molten or compacted molybdenum undergoes hot rolling, forging, or sintering to achieve the desired shape. Further heat treatments, such as stress relieving at elevated temperatures, help refine grain structure. Afterwards, precise machining (grinding or polishing) is performed to ensure dimensional accuracy and a uniform surface quality.

Q3: Which quality standards and certifications apply to Molybdenum Sputtering Target 99.95%, Dia. 2 inch?

A3: These targets typically conform to ASTM B386 and ASTM B387 for molybdenum material specifications. Purity is verified through ICP-MS (Inductively Coupled Plasma Mass Spectrometry) or GD-MS (Glow Discharge Mass Spectrometry), ensuring 99.95% purity levels. Dimensional tolerances are checked using precise metrology tools, and suppliers often maintain ISO 9001 certification to guarantee consistent manufacturing processes, rigorous documentation, and traceability. This ensures reliable performance and minimal impurity content.

Related Information

1. Raw Materials - Mo Materials

Mo is a valuable material used in various sputtering applications. It is extracted and purified through advanced processing operations. Stanford Advanced Materials sources high-grade materials from reliable suppliers, ensuring quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

Several methods are used to produce Mo sputtering targets, including powder metallurgy. Each method results in different target characteristics such as density, grain structure, and surface properties. The manufacturing method is selected based on the intended application requirements and performance specifications.