ST7955 Molybdenum Sputtering Target 99.9%, Dia. 4 inch

Molybdenum Sputtering Target 99.9%, Dia. 4 inch Description

Our Molybdenum Sputtering Target (99.9% purity, 4-inch diameter) provides reliable performance for various thin-film deposition processes. Molybdenum’s high thermal and mechanical stability ensures uniform film thickness, excellent adhesion, and accurate control over coating properties. Its high melting point and noteworthy corrosion resistance make it appropriate for demanding environments and high-temperature applications. Moreover, the target’s precise dimensions and consistent purity result in fewer impurities and a reduced risk of contamination during sputtering operations.

With a carefully controlled manufacturing process and strict quality standards, our molybdenum target complies with the most stringent industry requirements. Whether used for microelectronics, solar panels, or decorative coatings, this high-grade Molybdenum Sputtering Target ensures dependable performance and prolonged service life. By selecting our sputtering target, you gain access to enhanced coatings, improved equipment efficiency, and assurance amidst challenging production conditions.

Molybdenum Sputtering Target 99.9%, Dia. 4 inch Applications

Recognised for its high melting point, low vapour pressure, and excellent thermal conductivity, the Molybdenum Sputtering Target 99.9% purity (4 inch diameter) demonstrates reliable performance in a range of deposition applications. Its robust physical properties provide excellent adhesion and improved film uniformity. Below are some key application areas where its distinctive qualities render it an appropriate choice for advanced engineering and high-precision manufacturing processes.

1. Thin Film Deposition Applications

·         PVD Coating: Utilises the target’s high purity to achieve dense, uniform films with minimal contamination.

·         Magnetron Sputtering: Utilises molybdenum’s strong adhesion properties to form durable surface layers.

2. Semiconductor Applications

·         Integrated Circuits: Contributes to precise conductor layers due to molybdenum’s excellent electrical performance.

·         Electronic Components: Ensures reliable circuit connections, benefitting from the target’s thermal stability under high processing temperatures.

3. Optical Coating Applications

·         Anti-reflective Coatings: Enables precise control over film thickness, improving optical clarity and performance.

·         Mirror Coatings: Provides excellent reflectivity and strong adhesion, making it a suitable choice for high-end reflective surfaces.

Molybdenum Sputtering Target 99.9%, Dia. 4 inch Packaging

Each Molybdenum Sputtering Target 99.9% purity, 4-inch diameter, is encased in foam or bubble wrap, then vacuum-sealed to ensure dryness and prevent oxidation. This vacuum-sealed unit is placed in a sturdy, moisture-resistant container for additional protection during transit. Optional specialised packaging materials and labelling can be offered to meet specific requirements or shipping standards, guaranteeing the target arrives in optimal condition while retaining maximum performance.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Molybdenum Sputtering Target 99.9%, Dia. 4 inch FAQs

Q1: What are the key material properties of Molybdenum Sputtering Target 99.9%, Dia. 4 inch?

A1: This molybdenum target features a high melting point of approximately 2,623°C, excellent thermal conductivity, and low thermal expansion, making it stable under extreme conditions. Its density is around 10.2 g/cm³, providing good mechanical strength and hardness. The 99.9% purity guarantees minimal impurities, which aids in maintaining consistent film characteristics and reducing contamination. Its 4-inch diameter offers a substantial surface area for uniform sputtering and high deposition rates.

Q2: How can this Mo sputtering target be processed or fabricated?

A2: Typically, the fabrication starts with high-purity molybdenum powder that undergoes powder metallurgy techniques, including compaction and sintering under vacuum. The sintered blank is then hot-rolled or forged to refine grain structure and enhance density while minimising internal pores. Subsequently, precision machining and polishing steps ensure the target achieves optimal flatness and uniform thickness. This controlled process guarantees consistent sputtering performance and reduces film defects.

Q3: Which quality standards and certifications apply to Molybdenum Sputtering Target 99.9%, Dia. 4 inch?

A3: Common standards include compliance with ASTM B386 or B387 for molybdenum products, ensuring appropriate chemical composition and mechanical properties. Manufacturers often maintain ISO 9001-certified quality management systems to guarantee consistent production processes and traceability. Additionally, third-party laboratory analyses may verify purity at or above 99.9%, measuring impurities such as oxygen and metallic traces to ensure conformance with end-user requirements and industry specifications.

Related Information

1. Raw Materials - Mo Materials

Mo is a valuable material used in various sputtering applications. It is extracted and purified through advanced processing operations. Stanford Advanced Materials sources high-grade materials from reliable suppliers, ensuring quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

Several methods are employed to produce Mo sputtering targets, including powder metallurgy. Each method results in distinct target characteristics such as density, grain structure, and surface properties. The chosen manufacturing method is based on the intended application requirements and performance specifications.