ST7970 Molybdenum Niobium Alloy Planar Target MoNb10

Molybdenum Niobium Alloy Planar Target MoNb10 Description

Our Molybdenum Niobium Alloy Planar Target (MoNb10) is engineered to deliver performance across a wide range of demanding applications. The addition of 10% niobium to molybdenum enhances mechanical strength, thermal stability, and oxidation resistance, making this alloy ideal for use in thin-film deposition, semiconductor fabrication, and advanced research environments. Our customers can specify customised dimensions and purity levels to meet unique project requirements, ensuring a precise fit and optimal performance for every application.

Every MoNb10 planar target undergoes rigorous quality control measures, ensuring consistent composition and superior material purity. From raw material selection to final inspection, each step of the manufacturing process adheres to internationally recognised standards. Trust our commitment to quality, reliability, and innovation to help you achieve the precision and performance you need for your next endeavour.

Molybdenum Niobium Alloy Planar Target MoNb10 Applications

Molybdenum Niobium Alloy Planar Target (MoNb10) is highly valued for its exceptional thermal stability, corrosion resistance, and mechanical strength. Ideal for advanced material engineering, MoNb10’s uniform microstructure and reliability enable precise and efficient results in complex manufacturing processes. The following sections highlight key applications where this alloy’s properties make it a prime choice for diverse industries, from electronics to optics.

1. Thin Film Deposition Applications

·         PVD Coating: MoNb10’s high melting point and stable composition allow uniform and durable protective layers on various substrates.

·         Magnetron Sputtering: The alloy’s excellent sputter yield ensures efficient film formation and consistent thickness in industrial coating systems.

2. Semiconductor Applications

·         Integrated Circuits: MoNb10’s thermal stability helps maintain device performance and longevity under demanding fabrication conditions.

·         Electronic Components: This alloy’s corrosion resistance supports reliable interconnects and contacts in high-precision electronic assemblies.

3. Optical Coating Applications

·         Anti-reflective Coatings: MoNb10’s uniform microstructure provides effective optical coatings, reducing glare and enhancing device efficiency.

·         Mirror Coatings: Its mechanical properties and excellent adhesion characteristics enable high-reflectivity mirror finishes for optical systems.

Molybdenum Niobium Alloy Planar Target MoNb10 Packaging

Each Molybdenum Niobium Alloy Planar Target MoNb10 is carefully secured with polyethylene wrap and foam cushioning to prevent surface abrasions. The target is then hermetically sealed in a high-grade vacuum bag to guard against oxidation and contamination during shipment. A protective outer carton or crate is used for further impact resistance. Anti-oxidation measures and size, shape, and labelling customisation are available to meet specific requirements.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Molybdenum Niobium Alloy Planar Target MoNb10 FAQs

Q1: What are the key material properties of Molybdenum Niobium Alloy Planar Target MoNb10?

A1: Molybdenum Niobium Alloy Planar Target MoNb10 combines the high-temperature strength of molybdenum with the corrosion resistance and ductility provided by niobium. It typically features a high melting point above 2,600°C, excellent oxidation resistance under vacuum or inert atmospheres, and a low coefficient of thermal expansion. Its microstructure can be finely controlled to optimise thermal conductivity, making it suitable for demanding semiconductor and thin-film applications.

Q2: How can this MoNb10 sputtering target be processed or fabricated?

A2: MoNb10 sputtering targets are typically produced using powder metallurgy routes, followed by vacuum hot pressing or hot isostatic pressing to ensure uniform density. After consolidation, the target is subjected to precision machining to achieve the desired surface finish and dimensional tolerances. Additional heat treatments or stress relief processes may be introduced to optimise microstructural homogeneity. Quality control includes non-destructive testing and elemental composition verification.

Q3: Which quality standards and certifications apply to Molybdenum Niobium Alloy Planar Target MoNb10?

A3: Quality for MoNb10 targets often adheres to certifications such as ISO 9001 for manufacturing consistency, ISO 14001 for environmental management, and relevant ASTM standards for chemical composition and mechanical properties. Traceability is ensured throughout production, accompanied by detailed material test reports. Some manufacturers also apply advanced inspection methods like ultrasonic or eddy current testing to validate internal integrity and meet stringent industry and customer-specific requirements.

Related Information

1. Raw Materials - MoNb10 Materials

MoNb10 is a valuable material used in various sputtering applications. It is extracted and purified through advanced processing operations. Stanford Advanced Materials sources high-grade materials from reliable suppliers, ensuring quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

Several methods are used to produce MoNb10 sputtering targets, including powder metallurgy. Each method results in different target characteristics such as density, grain structure, and surface properties. The manufacturing method is selected based on the intended application requirements and performance specifications.