ST9137 High Purity Aluminum Sputtering Target (4N)

High Purity Aluminium Sputtering Target (4N) Description

Our High Purity Aluminium Sputtering Target (4N) is meticulously crafted to meet the stringent demands of modern thin-film deposition processes. With a certified purity of 99.99%, it delivers exceptional consistency in film thickness, adhesion, and uniformity. Each target is manufactured through advanced refining techniques, ensuring a low level of impurities and minimal gas content. This high-grade aluminium sputtering target exhibits notable stability and corrosion resistance, enabling reliable performance in critical vacuum environments.

Thanks to its superior purity, our 4N Aluminium Sputtering Target is widely used across semiconductor, microelectronics, and optical coating applications. It supports precise material transfer, resulting in smooth, defect-free coatings suitable for integrated circuits, display panels, and other high-tech components. Rigorously tested and produced under strict quality standards, it offers dependable results for your processes.

High Purity Aluminium Sputtering Target (4N) Applications

High Purity Aluminium Sputtering Target (4N) offers extremely low levels of impurities, delivering superior conductivity, excellent surface finish, and uniform thin films for demanding applications. This advanced material’s reliability and chemical inertness make it ideal for specialised processes across various fields. Below are key areas where High Purity Aluminium Sputtering Target (4N) can significantly enhance performance.

1. Industrial Applications

·        Application 1: Utilised in high-performance coating systems, providing consistent film thickness for reliable equipment protection.

·        Application 2: Employed in advanced automotive components to improve corrosion resistance and thermal properties.

2. Research Applications

·        Application 1: Used in thin-film experimentation to test new compounds and optimise electronic device performance.

·        Application 2: Essential for developing innovative material composites, enabling precise control over film morphology and purity.

3. Commercial Applications

·        Application 1: Applied in consumer electronics to achieve smooth, reflective surfaces that enhance product aesthetics and durability.

·        Application 2: Integrated into commercial lighting fixtures, offering long-lasting mirror-like finishes for improved illumination efficiency.

High Purity Aluminium Sputtering Target (4N) Packaging

Each High Purity Aluminium Sputtering Target (4N) is protected with double-layer vacuum-sealed packaging, ensuring minimal exposure to moisture and airborne particulates. For added security, foam inserts or rigid enclosures safeguard against impact during transit. Store in a clean, dry environment under controlled conditions to prevent contamination. Optional custom packaging, including sealed containers and shock-resistant materials, is available to meet specific size and purity requirements for optimal sputtering results.

Packaging: Vacuum sealed, Wooden Box, or Customised.

High Purity Aluminium Sputtering Target (4N) FAQs

Q1: What are the key material properties of High Purity Aluminium Sputtering Target (4N)?

A1: High Purity Aluminium Sputtering Target (4N) typically has 99.99% aluminium content with minimal impurity levels. This high-grade composition ensures excellent thermal and electrical conductivity, making it ideal for advanced metallisation processes in semiconductor devices. Its refined grain structure promotes uniform sputtering, resulting in consistent film thickness. Moreover, the low contamination profile helps maintain device integrity, thereby meeting stringent requirements in various microelectronic and optical applications.

Q2: How should this product be handled and stored?

A2: To preserve the 4N purity and maintain performance, High Purity Aluminium Sputtering Targets must be stored in a controlled environment with minimal exposure to contaminants and humidity. Protective gloves and cleanroom garments should be worn when handling the targets to avoid surface damage or particulate transfer. It is recommended to shield them from mechanical shocks and keep them in sealed packaging until ready for immediate use.

Q3: Which quality standards and certifications apply to High Purity Aluminium Sputtering Target (4N)?

A3: High Purity Aluminium Sputtering Target (4N) typically complies with ISO 9001 quality management systems, ensuring consistent manufacturing and traceability. Suppliers frequently perform rigorous purity analysis using advanced techniques such as GDMS or ICP-MS to meet 99.99% purity requirements. Additional certifications, such as RoHS, may also apply, guaranteeing compliance with environmental directives. All process steps generally follow strict internal protocols under controlled conditions for reproducibility and reliability.

Related Information

1. Material Properties and Advantages

The 4N high purity aluminium sputtering target is characterised by its exceptional aluminium content, ensuring minimal trace impurities that might otherwise compromise thin-film deposits. This remarkable purity level enables manufacturers to produce ultra-clean coatings with reduced defect rates, resulting in improved electrical conductivity and reflective properties.

Utilising advanced refining techniques, the target exhibits superior thermal conductivity and ductility, making it highly versatile in demanding fabrication processes. Its ability to maintain stable performance under high temperatures and vacuum conditions makes it a preferred choice for intricate deposition tasks in semiconductor chips, optical devices, and other advanced applications.

2. Applications in Advanced Industries

Among the many uses of a 4N high purity aluminium sputtering target, the aerospace and defence sectors benefit from its consistent film formation and reliable protective coatings. This product’s uniform deposition characteristics are especially valuable in creating robust layers for radiation shielding, anti-corrosion measures, and enhanced thermal management solutions.

Electronics manufacturers also rely on 4N high purity aluminium sputtering targets to achieve improved signal transmission and decreased interference in microchip connections. By ensuring low impurity incorporation during deposition, these targets enable high-performance circuits for telecommunications, data centres, and emerging technologies such as quantum computing components.