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  • ST0006 Cadmium (Cd) Sputtering Target

    • ST0006 Cadmium (Cd) Sputtering Target

    Catalogue Number ST0006
    Composition Cd
    CAS Number 7440-43-9
    Purity ≥99%
    Shape Discs, or Custom-made
    Diameter 2", 3", 4", 5", 6", or customized
    Thickness 0.25", 0.125", or customized
    Bond Type Copper, or customized

    The Cadmium (Cd) Sputtering Target is developed using advanced techniques to ensure high performance and reliability in sophisticated sputtering applications. Stanford Advanced Materials is committed to innovation and excellence, supplying high-quality materials that enable modern technological solutions.

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    LAST RECOMMENDATION

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    ST0031 Neodymium (Nd) Sputtering Target
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    ST0033 Niobium (Nb) Sputtering Target
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    ST0036 Praseodymium (Pr) Sputtering Target
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    NB0036 Niobium target disc, Nb target disc
    Silver (Ag) Sputtering Target
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    Tantalum Sputtering Target
    ST1051 Tantalum sputter target (Ta sputter target)

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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
      • 3''
      • 4''
      • 5''
      • 6''
      • Other
      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
      • Other
      Bonding

      Yes

      • Yes
      • No
      • Other
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