ST0008 Cerium (Ce) Sputtering Target

Cerium (Ce) Sputtering Target Description

The Cerium (Ce) Sputtering Target is designed to achieve optimal performance in thin film deposition and physical vapour deposition. This target is manufactured to a high purity level (≥99%) ensuring consistent sputter yield and high-quality film formation under both RF and DC conditions. Its design accommodates both standard discs and custom shapes, making it a versatile choice for semiconductor manufacturing, optical coatings, and modern research applications. The properties of Cerium ensure a long operational life and reliable performance under challenging processing conditions.

Cerium (Ce) Sputtering Target Applications

- Semiconductor Manufacturing: Ideal for depositing uniform thin films in integrated circuits and electronic devices.
- Optical Coatings: For precise reflective and anti-reflective coatings in modern optical applications.
- Microelectronics: Supports the production of high-precision components in sensors, displays, and other devices.
- Research and Development: Widely used in laboratories focused on advanced materials science and nanotechnology.
- Industrial Surface Engineering: Serves various surface modification processes in demanding industrial operations.

Cerium (Ce) Sputtering Target Packing

Our Cerium (Ce) Sputtering Targets are carefully packed to maintain their pristine condition and performance. Each target, whether a standard disc or a custom configuration, is vacuum-sealed in protective packaging to ensure safe storage and contamination-free transport.

Frequently Asked Questions

Q: What are the main applications for Cerium (Ce) Sputtering Targets?
A: They are primarily used in semiconductor manufacturing, optical coatings, microelectronics, and modern materials research for thin film deposition.

Q: What benefits do the RF and DC sputtering modes provide for the target's performance?
A: The capability to sputter in two operational modes allows for flexible working conditions and ensures optimal film deposition and consistent sputter efficiency across various industrial applications.

Q: Can the shape of the sputtering target be customised?
A: Yes, our Cerium (Ce) Sputtering Targets are available as standard discs or can be custom manufactured to meet specific application requirements.

Q: What purity level is guaranteed for these sputtering targets?
A: Each target is manufactured with a purity level of ≥99%, which guarantees consistent performance and reliable film deposition.

Q: How is the product packaged to avoid contamination during transport?
A: The targets are vacuum-sealed in protective packaging, ensuring they remain contamination-free and in optimal condition during storage and shipping.