ST0039 Ruthenium (Ru) Sputtering Target

Ruthenium (Ru) Sputtering Target Description

The Ruthenium (Ru) Sputtering Target is a high-performance material developed for advanced sputtering applications. This target is manufactured using advanced production techniques, ensuring uniform film deposition and excellent operational stability during the sputtering process. Its high purity and tailored physical properties make it an ideal solution for the production of high-quality thin film coatings in microelectronics, optical devices, and other precision applications. Its exceptional wear resistance and high thermal stability meet the stringent requirements of modern manufacturing and research environments.

Ruthenium (Ru) Sputtering Target Applications

- Microelectronics: Ideal for the deposition of uniform, conductive thin films for integrated circuits and semiconductor devices.
- Optical coatings: To enhance the reflective and anti-reflective properties of high-performance optical components.
- Decorative coatings: Provides durable, aesthetically pleasing coatings on various substrates.
- Solar cells: Utilised in multilayer coating systems to improve efficiency and longevity.

Ruthenium (Ru) Sputtering Target Packing

Our Ruthenium (Ru) Sputtering Target is securely packed to maintain its integrity and performance.
Vacuum-sealed packaging: Standard container sizes are available upon request. Custom packaging solutions are offered to meet specific customer requirements.

Frequently Asked Questions

Q: What advantages does using a Ruthenium (Ru) Sputtering Target offer?
A: Ruthenium targets provide excellent film uniformity, high purity, and superior stability, making them ideal for high-precision thin film deposition in advanced technological applications.

Q: Which sputtering method is recommended for this target?
A: The target is optimised for DC sputtering, ensuring consistent performance and reliable film formation.

Q: How is the Ruthenium (Ru) Sputtering Target manufactured?
A: It is produced using advanced manufacturing techniques that guarantee high purity and precision, tailored to meet the stringent requirements of modern sputtering processes.

Q: Are custom shapes and sizes available for this product?
A: Yes, in addition to standard discs, custom shapes and sizes can be manufactured to meet specific application requirements.

Q: How does the high purity of the target affect its sputtering performance?
A: The high purity (≥99%) minimises contamination during deposition, resulting in excellent film quality, improved adhesion, and consistent electrical properties of the final coating.