Discontinued (Discontinued) ST0050 Terbium (Tb) Sputtering Target

Terbium (Tb) Sputtering Target Description

The Terbium (Tb) Sputtering Target is a high-purity material specifically prepared for advanced thin film deposition processes. It is produced using advanced techniques to ensure a high level of purity and consistency. This target demonstrates exceptional performance across various applications, providing uniform and reliable coatings. Its superior physical properties make it an optimal choice for sectors requiring precise and dependable sputtering results.

Terbium (Tb) Sputtering Target Applications

- Microelectronics: Essential for the production of precise thin films in display technology and semiconductor devices.
- Magneto-optical Devices: Utilised in the manufacturing of advanced optical and magnetic components.
- Thin Film Coatings: Ideal for applications that demand high uniformity and excellent adhesion properties.
- Research and Development: Suitable for state-of-the-art experiments in materials science and nanotechnology.
- Industrial Coatings: Used to produce durable, high-performance coatings for specialised equipment.

Terbium (Tb) Sputtering Target Packing

Our Terbium (Tb) Sputtering Target is securely packaged to maintain its high purity and structural integrity during storage and transport.
Vacuum-sealed Packaging: Typically available in customised sizes to meet specific process requirements.

Frequently Asked Questions

Q: In which sectors are Terbium sputtering targets commonly used?
A: They are frequently employed in the semiconductor, microelectronics, and magneto-optical device industries for the precise deposition of thin films.

Q: Why is RF sputtering recommended for this target?
A: RF sputtering provides a stable plasma environment, ensuring uniform film deposition and maintaining the integrity of high-purity targets such as Terbium.

Q: How does the purity of the Terbium sputtering target affect performance?
A: A purity level of ≥99% minimises contaminants that could otherwise affect film uniformity and overall device performance, thereby ensuring reliable results.

Q: Can the size of the sputtering target be customised?
A: Yes, the Terbium (Tb) Sputtering Target is available in a range of customised sizes to meet the specific requirements of applications and coating systems.

Q: What measures are taken during packaging to protect the sputtering target?
A: The target is packaged in a secure vacuum-sealed container to prevent oxidation and contamination, ensuring its high purity is maintained until use.