Discontinued (Discontinued) ST0054 Tungsten (W) Sputtering Target

Tungsten (W) Sputtering Target Description

Tungsten (W) Sputtering Target is manufactured from high-purity tungsten (W) using precision fabrication techniques to ensure exceptional quality and performance. Designed for advanced sputtering applications, this target exhibits excellent thermal stability and durability, making it the ideal choice for thin film deposition, semiconductor manufacturing, and industrial coating processes. Its physical properties and customizable shapes ensure reliable performance even in demanding high-power environments.

Tungsten (W) Sputtering Target Applications

· Semiconductor Manufacturing: Essential for integrated circuit fabrication and microelectronic devices.
· Thin Film Deposition: Enables high-quality coatings for optical and electronic components.
· Industrial Coatings: Provides durable and uniform layers for wear-resistant and corrosion-protective applications.
· Research and Development: Widely used in materials science studies and experimental sputtering techniques.

Tungsten (W) Sputtering Target Packing

Our Tungsten (W) Sputtering Target is packaged with care to maintain its high purity and structural integrity throughout storage and transportation. Packaging options include vacuum-sealed discs or custom-made configurations, ensuring safe delivery to our customers.

Frequently Asked Questions

Q: How is the purity of the tungsten sputtering target maintained during manufacturing?
A: Tungsten undergoes processing under controlled environments using high-purity raw materials and precision fabrication techniques, ensuring a purity level of ≥99%.

Q: Can the shapes of the sputtering target be customised?
A: Yes, aside from standard discs, custom-made shapes are available to meet specific application requirements.

Q: What sputtering method is recommended for this target?
A: The Tungsten (W) Sputtering Target is optimised for DC sputtering systems, which are commonly used in industrial deposition processes.

Q: How does tungsten’s high melting point benefit sputtering applications?
A: The exceptionally high melting point (3422 °C) ensures that tungsten maintains its integrity and performance during high-temperature sputtering operations.

Q: What precautions should be taken when handling tungsten sputtering targets?
A: It is recommended to handle the targets with clean gloves and store them in a controlled environment to prevent contamination and physical damage.