Discontinued (Discontinued) ST0057 Yttrium (Y) Sputtering Target

Yttrium (Y) Sputtering Target Description

The Yttrium (Y) Sputtering Target is designed specifically for high-precision vacuum coating applications. This target is manufactured with a purity of ≥99% and is available in the form of discs, but can also be custom-made according to your production requirements. It supports both RF and DC sputtering techniques and ensures reliable and uniform film deposition. With its excellent thermal and physical properties, this target is the ideal choice for industries requiring high-performance materials.

Yttrium (Y) Sputtering Target Applications

- Electronics Manufacturing: Essential for the production of thin films in electronic devices.

- Production of Semiconductor Devices: Enables high-quality depositions for advanced circuits.

- Optical Coatings: Ideal for applying uniform coatings on various optical components.

- Advanced Material Research: Supports innovative experiments and developments in material sciences.

Yttrium (Y) Sputtering Target Packing

Our Yttrium (Y) Sputtering Targets are carefully packaged to maintain their integrity and performance. The products are vacuum-sealed and packaged according to customer specifications to ensure optimal protection during storage and transport.

Frequently Asked Questions

Q: What advantage does using a Yttrium (Y) Sputtering Target offer in deposition processes?
A: It provides a high degree of purity and excellent consistency during deposition, resulting in outstanding film uniformity and performance across various applications.

Q: Which industries commonly utilise Yttrium (Y) Sputtering Targets?
A: Industries such as electronics manufacturing, semiconductor production, optical coatings, and advanced material research benefit from the use of this sputtering target.

Q: Can the shape of the Yttrium (Y) Sputtering Target be customised?
A: Yes, the targets are available in standard disc forms or can be custom-fabricated to meet specific application requirements.

Q: How do RF and DC sputtering techniques benefit from this target?
A: The Yttrium (Y) Sputtering Target is optimised for both RF and DC sputtering, providing flexibility and consistent performance in various deposition configurations.

Q: Why is a purity of ≥99% important in sputtering targets?
A: High purity minimises contamination during deposition, which is critical for producing reliable, high-quality layers for demanding applications.