ST0072 Chromium Copper (Cr/Cu) Sputtering Target

Chromium-Copper (Cr/Cu) Sputtering Target Description

The Chromium-Copper (Cr/Cu) Sputtering Target is designed for optimal performance in thin film deposition technology. This product is manufactured with a focus on high purity and customisable design, meeting the stringent standards required in advanced electronics and semiconductor production. Its unique combination of Chromium and Copper provides excellent durability and surface uniformity, making it an ideal choice for applications that require precise layer formation. The target is designed to deliver reliable performance in demanding production environments and ensures consistently high-quality results.

Chromium-Copper (Cr/Cu) Sputtering Target Applications

- Electronics Manufacturing: For the deposition of conductive layers and connections in semiconductor devices.
- Optical Coatings: Utilised in the production of reflective and anti-reflective layers on various substrates.
- Thin Film Deposition: Ideal for creating uniform functional coatings on various industrial components.
- Advanced Manufacturing: Supports state-of-the-art processes in the research and production of high-tech devices.

Chromium-Copper (Cr/Cu) Sputtering Target Packing

Our Chromium-Copper Sputtering Targets are produced to customer specifications and handled with utmost care to maintain material integrity.
Packing options include vacuum-sealed containers and protective barrels to ensure the product remains in optimal condition during storage and transportation.

Frequently Asked Questions

Q: What is the purity level of the Chromium-Copper Sputtering Target?
A: The product is manufactured with a purity level of ≥99%.

Q: What forms are available for this sputtering target?
A: The target is available in standard disc forms or can be customised according to specific requirements.

Q: What bonding types are used for this product?
A: The commonly used bonding types are Indium and Elastomer.

Q: Which industries is the Chromium-Copper (Cr/Cu) Sputtering Target suitable for?
A: It is frequently used in electronics manufacturing, semiconductor production, optical coatings, and advanced thin film deposition processes.

Q: How can I order custom sizes of this sputter target?
A: Please contact our sales team and provide your specifications so we can discuss customisation options and order details.