Discontinued (Discontinued) ST0081 Cobalt Titanium (Co/Ti) Sputtering Target

Cobalt-Titanium (Co/Ti) Sputtering Target Description

The Cobalt-Titanium (Co/Ti) sputtering target provides a precise solution for advanced sputtering applications. This target is manufactured with a purity level of at least 99% and is available in disc form. It can also be custom-made to meet specific design requirements. Its optimised Co/Ti composition ensures consistent performance, making it suitable for thin film deposition in semiconductor manufacturing, microelectronics, and optical devices. The design and quality of the product ensure reliable operation, even in demanding processing environments.

Cobalt-Titanium (Co/Ti) Sputtering Target Applications

- Semiconductor manufacturing: Suitable for high-quality thin film deposition on semiconductor wafers.
- Microelectronics: Enhances device performance through uniform and reliable film deposition.
- Optics: Utilised in the production of optical coatings to improve light transmission and reflection.
- Surface coatings: Provides durable and consistent coatings for various industrial applications.
- Advanced research and development: Supports experimental processes in materials science and engineering.

Cobalt-Titanium (Co/Ti) Sputtering Target Packing

Our Cobalt-Titanium (Co/Ti) sputtering targets are packaged with great care to maintain product integrity during storage and transport. Custom packaging options are available to meet specific shipping and handling requirements.

Frequently Asked Questions

Q: What is the composition of the sputtering target?
A: The target consists of Cobalt and Titanium (Co/Ti) with a purity of at least 99%.

Q: What forms are available for the sputtering target?
A: The product is available in disc form or can be made to your specific requirements.

Q: In which industries is the Cobalt-Titanium (Co/Ti) sputtering target typically used?
A: It is commonly used in semiconductor manufacturing, microelectronics, optics, and various thin film coating applications.

Q: What advantages does the Co/Ti composition provide for sputtering processes?
A: The optimised Cobalt-Titanium mixture ensures a high-performance target that consistently produces high-quality thin films, even under challenging conditions.

Q: Can I request a custom size for my sputtering target?
A: Yes, the available sizes are fully customisable to meet your application requirements.