ST0129 Aluminum Oxide (Al2O3) Sputtering Target

Aluminium Oxide (Al2O3) Sputtering Target Description

The Aluminium Oxide (Al2O3) Sputtering Target is designed to provide exceptional performance in precision sputtering processes. Manufactured under stringent quality controls, this target offers consistent and reliable deposition for high-tech applications. Its high purity and effective performance make it suitable for critical applications in semiconductors, displays, and modern coating systems.

Aluminium Oxide (Al2O3) Sputtering Target Applications

- Semiconductor Manufacturing: Essential for creating high-quality thin films in electronic devices.
- Display Technologies: Suitable for the deposition of transparent conductive layers in modern displays.
- Coating Systems: For the deposition of protective and functional layers in optics and aerospace.
- Research and Development: Ideal for experimental setups requiring high-performance sputtering targets.

Aluminium Oxide (Al2O3) Sputtering Target Packaging

The Aluminium Oxide (Al2O3) Sputtering Target is carefully packaged to ensure optimal quality during storage and transport.
Packaging: Vacuum-sealed packaging, tailored to customer requirements, with standard sizes available upon request.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a material used in sputtering coating processes to form thin layers on various substrates in industries such as semiconductor manufacturing and display technology.

Q: What does RF-R mean in relation to sputtering targets?
A: RF-R refers to radio frequency reactive sputtering, a method that employs high frequency energy in a reactive gas environment to achieve precise layer deposition.

Q: How is the high purity (≥99%) of the Aluminium Oxide (Al2O3) Sputtering Target ensured?
A: The high purity is ensured through strict quality control measures and advanced manufacturing techniques designed to minimise contamination throughout the production process.

Q: Can the size of the sputtering targets be customised?
A: Yes, the Aluminium Oxide (Al2O3) sputtering targets are available in custom sizes to meet specific customer requirements and application needs.

Q: Which industries benefit most from the use of Aluminium Oxide (Al2O3) sputtering targets?
A: Industries such as semiconductor manufacturing, display technology, coating systems, and research and development significantly benefit from the performance of these sputtering targets.