Discontinued (Discontinued) ST0131 Antimony-Doped Tin Oxide (ATO) Sputtering Target

Antimony-Doped Tin Oxide (ATO) Sputtering Target Description

The Antimony-doped Tin Oxide (ATO) sputtering target is a state-of-the-art material developed for high-performance thin film deposition processes. With a unique Sb2O3-SnO2 composition and a purity of at least 99%, this target is designed to provide excellent reliability and uniformity during sputtering. Its outstanding material properties ensure stable deposition for demanding applications, enabling precise layer control and consistency across a range of substrates.

Antimony-Doped Tin Oxide (ATO) Sputtering Target Applications

- Thin Film Deposition: Ideal for depositing uniform layers in displays, solar cells, and other electronic devices.
- Electronics Manufacturing: Used for producing conductive coatings and transparent electrodes.
- Surface Coatings: Applicable in advanced coating processes to enhance thermal and optical properties.
- Research and Development: Facilitates experimental setups in materials science and nanofabrication.

Antimony-Doped Tin Oxide (ATO) Sputtering Target Packaging

Our Antimony-doped Tin Oxide sputtering targets are carefully packaged to preserve their integrity and performance. Each target is vacuum-sealed and handled according to strict quality control procedures to ensure optimal condition upon delivery. Packaging options are customizable to meet specific logistics and storage requirements.

Frequently Asked Questions

Q: What is the primary use of the ATO sputtering target?
A: The ATO sputtering target is primarily used for thin film deposition in electronics, such as for transparent conductive layers for displays and solar cells.

Q: How is the antimony-doped tin oxide sputtering target manufactured?
A: It is produced using precise powder processing techniques and sintering methods to obtain a high-purity, homogeneous material ideal for sputtering applications.

Q: What are the main properties of the ATO sputtering target?
A: Key properties include high purity (≥99%), controlled density (6.8 g/cm³), and a composition optimised for uniform thin film deposition.

Q: Can the shape of the sputtering targets be customised?
A: Yes, the targets are available in standard discs or can be customised to specific design requirements.

Q: Which industries benefit most from using ATO sputtering targets?
A: Industries such as electronics, photonics, and modern materials research benefit from the excellent performance in thin film deposition.