Discontinued (Discontinued) ST0145 Dysprosium Oxide (Dy2O3) Sputtering Target

Dysprosium Oxide (Dy2O3) Sputtering Target Description

The Dysprosium oxide (Dy2O3) sputtering target has been developed for precision applications in sputtering processes. This target is produced with a purity of ≥99% to ensure high performance and consistency during film deposition. Its thermal properties and compatibility with RF and DC sputtering systems offer versatility for semiconductor, optical, and industrial applications. The product is designed for reliability and uniformity, making it an essential component in modern coating and thin-film technologies.

Dysprosium Oxide (Dy2O3) Sputtering Target Applications

- Semiconductor Manufacturing: Ideal for thin-film deposition in microelectronic devices and integrated circuits.
- Optical Coatings: Facilitates the production of high-quality optical coatings with excellent transparency and durability.
- Industrial Sputtering: Utilised in plasma sputtering processes for precise surface treatments.
- Research and Development: Provides reliable material for experimental setups in materials science and nanotechnology.

Dysprosium Oxide (Dy2O3) Sputtering Target Packing

Our Dysprosium oxide (Dy2O3) sputtering target is carefully packaged to maintain its integrity and performance during transport. We offer customised packaging options to meet the specific requirements of our clients and ensure optimal delivery and storage conditions.

Frequently Asked Questions

Q: In which industries are Dysprosium oxide sputtering targets commonly used?
A: They are commonly used in semiconductor manufacturing, optical coating production, industrial sputtering, and research and development in materials science.

Q: What advantages does the high purity level (≥99%) offer for the sputtering process?
A: The high purity level ensures uniform and defect-free film deposition, which is critical for high-performance applications and the reliable production of components.

Q: Can the sputtering target be used with both RF and DC sputtering systems?
A: Yes, the target is designed to be compatible with both RF and DC sputtering processes, providing flexibility for various industrial applications.

Q: Are custom shapes available for specific applications?
A: Yes, the product is typically available in disk form, but custom shapes can be provided to meet specific application requirements.

Q: What measures are taken to ensure the quality of the disk during shipping?
A: The product is packaged with tailored solutions to protect it from damage and contamination, ensuring it arrives in optimal condition.