ST0159 Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Target

Lanthanum-Calcium-Manganese (La0.67Ca0.33MnO3) Sputter Target Description

The Lanthanum-Calcium-Manganese (La0.67Ca0.33MnO3) sputter target has been developed for advanced applications in thin film deposition. It is manufactured from a precise mixture of La2O3, Mn3O4, and CaO, ensuring consistent performance under demanding sputtering conditions. Its high purity and controlled microstructure enable reliable deposition in both research and industrial environments. It is compatible with RF, RF-R, and DC sputter systems, providing uniform film quality and excellent adhesion properties.

Lanthanum-Calcium-Manganese (La0.67Ca0.33MnO3) Sputter Target Applications

- Semiconductor Device Fabrication: Ideal for producing high-quality thin films in electronic components.
- Optical Coatings: Suitable for manufacturing precise optical filters, mirrors, and other components.
- Display Technologies: Supports deposition processes in the manufacture of LCD and OLED panels.
- Advanced Research: Delivers consistent performance for materials science studies and experimental applications.
- Industrial Coatings: Provides excellent film uniformity for protective and functional coatings across various industries.

Lanthanum-Calcium-Manganese (La0.67Ca0.33MnO3) Sputter Target Packaging

Our sputter targets are packaged with the utmost care to ensure they arrive in pristine condition. They are available in standard disk format or custom configurations and are shipped under controlled conditions to maintain their high quality during transport.

Frequently Asked Questions

Q: Which sputtering techniques are compatible with this target?
A: This target is compatible with RF, RF-R, and DC sputter systems, making it versatile for various thin film deposition processes.

Q: Can I request a custom shape or size for the sputter target?
A: Yes, the product is available in standard discs or can be custom manufactured to meet specific application requirements.

Q: What advantages does the La2O3 / Mn3O4 / CaO composition offer for the sputtering process?
A: The precise composition ensures high purity and a controlled microstructure, resulting in consistent film quality, stable deposition conditions, and improved performance.

Q: In which industries are Lanthanum-Calcium-Manganese sputter targets typically used?
A: They are commonly employed in semiconductor manufacturing, optical coating production, display technology, and advanced research applications.

Q: How does the high melting point of ~1400-1500℃ benefit sputtering applications?
A: A high melting point ensures excellent thermal stability during sputtering, allowing the target to operate at high power without performance degradation.