ST0161 Lanthanum Nickel Oxide (LaNiO3) Sputtering Target

Lanthanum Nickel Oxide (LaNiO3) Sputtering Target Description

The Lanthanum Nickel Oxide (LaNiO3) sputtering target offers exceptional purity and performance, making it the optimal choice for precision deposition in various high-technology applications. Manufactured to rigorous standards, this target is available in disc form or can be custom-made to meet specific process requirements. Its advanced design supports optimal sputtering behaviour and provides uniform and reliable thin films on a variety of substrates.

Lanthanum Nickel Oxide (LaNiO3) Sputtering Target Applications

- Thin film deposition for semiconductor devices and photovoltaic cells.
- Surface coating applications in advanced electronic components.
- Microelectronics manufacturing requiring highly precise and ultra-pure deposition.
- Research and development processes in materials science and nanotechnology.

Lanthanum Nickel Oxide (LaNiO3) Sputtering Target Packing

Our Lanthanum Nickel Oxide sputtering targets are packaged in highly integrated, moisture-resistant, vacuum-sealed packaging to maintain quality and performance during storage and transport. Custom packaging solutions are available upon request to meet specific logistical requirements.

Frequently Asked Questions

Q: What is sputtering?
A: Sputtering is a physical vapour deposition process whereby energetic particles eject material from a target and deposit a thin film onto a substrate.

Q: What advantages does the Lanthanum Nickel Oxide target offer?
A: It provides a high degree of purity and excellent performance for uniform layer deposition, ensuring better adhesion and consistency across various substrates.

Q: Which sputtering processes are compatible with this target?
A: This target is compatible with RF, RF-R, and DC sputtering systems, making it versatile for various deposition applications.

Q: Can this target be customised in shape or size?
A: Yes, in addition to standard disc shapes, the target can be custom fabricated to meet specific application requirements.

Q: In which industries are Lanthanum Nickel Oxide sputtering targets commonly used?
A: They are commonly used in semiconductor manufacturing, photovoltaic cell production, modern electronics, and various research applications.