ST0163 Lanthanum Oxide (La2O3) Sputtering Target

Lanthanum Oxide (La2O3) Sputtering Target Description

The Lanthanum Oxide (La2O3) Sputtering Target is engineered for precision and high performance in advanced sputtering applications. Manufactured with a purity of ≥99%, this target ensures minimal contamination and exceptional consistency in deposition processes. Its robust design, available in standard disc shapes or as custom-made solutions, meets the diverse needs of industries ranging from semiconductor fabrication to thin film coatings. The material’s excellent thermal stability and unique physical properties make it an indispensable component in both research and industrial settings.

Lanthanum Oxide (La2O3) Sputtering Target Applications

· Thin Film Deposition: Ideal for creating high-quality optical coatings and semiconductor layers.
· Electronics: Used in manufacturing various electronic components for enhanced performance.
· Advanced Ceramics: Supports the production of refractory and high-temperature ceramic materials.
· Research and Development: Provides reliable performance for experimental sputtering in academic and industrial labs.
· Surface Engineering: Employed in the development of protective coatings and functional surfaces.

Lanthanum Oxide (La2O3) Sputtering Target Packing

Our Lanthanum Oxide (La2O3) Sputtering Targets are packaged with care to maintain their high purity and structural integrity. Options include moisture-resistant and vacuum-sealed packaging tailored to customer specifications, ensuring safe storage and transportation.

Frequently Asked Questions

Q: What sputtering methods is this La₂O₃ target compatible with?
A: It is suitable for RF, RF-R, and DC sputtering processes, providing flexibility for various deposition techniques.

Q: Why is high purity (≥99%) important in a sputtering target?
A: High purity minimizes contamination risks during deposition, ensuring that the thin films produced have optimal physical and chemical properties.

Q: Can I get the target in a custom shape or size?
A: Yes, in addition to standard disc forms, our targets can be custom-made to meet specific customer requirements.

Q: What industries typically use Lanthanum Oxide sputtering targets?
A: They are widely used in semiconductor manufacturing, optical coating production, advanced ceramics, and research laboratories.

Q: How do you ensure the target remains intact during shipping?
A: Our targets are packaged using moisture-resistant and vacuum-sealed methods to protect them from environmental factors and mechanical damage during transit.