Discontinued (Discontinued) ST0174 Lutetium Oxide (Lu2O3) Sputtering Target

Lutetium Oxide (Lu2O3) Sputtering Target Description

The Lutetium oxide (Lu2O3) sputtering target undergoes a stringent manufacturing process to ensure high purity (≥99%) and excellent thermal properties. This target, available in both standard discs and custom shapes, meets the rigorous demands of sputtering coating processes. Its notable melting point of 2490℃ and density of 9.42 g/cm³ facilitate reliable performance in high-temperature and high-vacuum environments, making it a suitable option for high-tech applications.

Lutetium Oxide (Lu2O3) Sputtering Target Applications

- Sputtering deposition: Ideal for thin-film deposition in microelectronics and for contemporary coatings.

- Microelectronics: Essential for semiconductor manufacturing and component production.

- Optical coatings: Enhances the performance and durability of optical components.

- Modern materials research: Suitable for high-temperature and high-vacuum experimental setups.

Lutetium Oxide (Lu2O3) Sputtering Target Packaging

The Lutetium oxide (Lu2O3) sputtering target is packaged with utmost care to ensure quality during storage and transport. Custom packaging options are available to meet specific customer requirements, typically employing robust, vacuum-sealed containers to prevent contamination and ensure optimal handling.

Frequently Asked Questions

Q: What are the main applications of the Lutetium oxide sputtering target?
A: This target is primarily used in sputtering coating processes for applications in microelectronics, optical coatings, and modern materials research.

Q: What is the purity level of the Lutetium oxide sputtering target?
A: The target is manufactured with a purity level of ≥99%, ensuring high performance for precision applications.

Q: Can the target be produced in forms other than discs?
A: Yes, in addition to standard discs, the target can also be customised to meet specific design requirements.

Q: What benefits does the high melting point of 2490℃ offer for sputtering processes?
A: The high melting point provides excellent thermal stability during high-performance sputtering, thereby reducing substrate damage and ensuring consistent layer quality.

Q: What storage and packaging methods are recommended for this product?
A: The target should be stored in a controlled, dry environment; it is typically packaged in vacuum-sealed containers to protect against contamination during shipping.