ST0179 Nickel Oxide (NiO) Sputtering Target

Nickel Oxide (NiO) Sputtering Target Description

The Nickel Oxide (NiO) sputtering target is a high-performance material developed for advanced sputtering applications. Manufactured with a purity of ≥99%, it ensures stable and uniform layer deposition, which is essential for critical industrial processes. This target is available in standard disc form or custom configurations and has been optimised for RF magnetron sputtering to achieve uniform energy distribution and efficient thin film formation. With a melting point of 1955℃ and a density of 6.67 g/cm³, the target withstands extreme operating conditions, making it an ideal choice for the semiconductor, optics, and surface coating industries.

Nickel Oxide (NiO) Sputtering Target Applications

- Semiconductor Manufacturing: Provides high-quality thin films for electronic devices, sensors, and solar cells.
- Optical Coatings: Suitable for the production of modern coatings with controlled optical properties.
- Energy Devices: Useful for manufacturing components for batteries, fuel cells, and other energy systems.
- Research and Development: Serves as a reliable material for developing innovative sputtering techniques and material studies.

Nickel Oxide (NiO) Sputtering Target Packaging

Our Nickel Oxide (NiO) sputtering target is carefully packaged to preserve its purity and structural integrity during storage and transport. The targets are vacuum-sealed in custom packaging, which meets the specific requirements of our customers, providing optimal protection and performance during delivery.

Frequently Asked Questions

Q: What are the advantages of RF magnetron sputtering for this target?
A: RF magnetron sputtering enables more uniform energy distribution across the target, resulting in consistent thin film deposition even on insulating materials.

Q: What advantages does the high purity (≥99%) of the NiO target offer for sputtering applications?
A: The high purity reduces contaminants in the deposited layers and ensures better electrical, optical, and mechanical properties for high-performance applications.

Q: Can the target be customised to various sizes and shapes?
A: Yes, in addition to standard disc forms, our Nickel Oxide (NiO) sputtering target can also be custom manufactured to meet specific process requirements.

Q: Which industries are best suited to utilise this sputtering target?
A: Industries such as semiconductor manufacturing, optical coatings, energy devices, and advanced research laboratories greatly benefit from our high-performance NiO targets.

Q: How should the targets be handled to maintain their quality during shipping?
A: The targets are vacuum-sealed in specialised packaging designed to protect against contamination, physical damage, and environmental influences during transport.