ST0190 Strontium Zirconate (SrZrO3) Sputtering Target

Strontium Zirconate (SrZrO3) Sputtering Target Description

The Strontium Zirconate (SrZrO3) Sputtering Target is a high-performance material designed for the precise deposition of thin films in various advanced industrial applications. This target is manufactured with a purity of ≥99% and ensures consistency and reliability during sputtering processes in RF, RF-R, and DC systems. Its high melting point of ~2550℃ and a density of ~5.6 g/cm³ provide exceptional stability under extreme processing conditions, making it ideal for applications in microelectronics, optical coatings, and other high-temperature environments. Custom shapes, including standard discs, offer flexibility for specific industrial requirements.

Strontium Zirconate (SrZrO3) Sputtering Target Applications

- Thin film deposition: Essential for producing high-quality layers in micro and optoelectronic devices.
- Manufacturing electronic components: Used in the production of sensors, capacitors, and integrated circuits to achieve higher performance.
- Modern coatings: Employed in surface engineering for wear resistance and improved thermal stability.
- Research and development: Suitable for innovative experimental setups and academic research in materials science.

Strontium Zirconate (SrZrO3) Sputtering Target Packing

Our Strontium Zirconate Sputtering Targets are carefully packaged to ensure product integrity during storage and shipping. Custom packaging solutions are available to meet specific customer requirements and guarantee safe delivery in protective, industry-standard packaging.

Frequently Asked Questions

Q: Which sputtering methods are compatible with this target?
A: The target can be used with RF, RF-R, and DC sputtering systems.

Q: What is the purity level of the Strontium Zirconate target?
A: The target has a purity of ≥99%.

Q: Can the shape and size of the sputtering target be customised?
A: Yes, the target is available as standard discs or can be custom-made based on specific requirements.

Q: What is the melting point and density of the target material?
A: The melting point is ~2550℃, and the density is approximately ~5.6 g/cm³.

Q: What are the most common applications for the Strontium Zirconate sputtering target?
A: It is frequently used for thin film deposition in microelectronics, advanced coating processes, and R&D applications in high-temperature processing environments.