Discontinued (Discontinued) ST0192 Terbium Oxide (Tb4O7) Sputtering Target

Terbium Oxide (Tb4O7) Sputtering Target Description

The Terbium Oxide (Tb4O7) Sputtering Target is designed for high-performance sputtering coating processes. This target is manufactured with careful quality control to achieve a purity of ≥99%. It is available in standard disc forms or can be custom-made for specific applications. Its excellent thermal properties, underscored by a high melting point of ~2340℃ and a density of 7.91 g/cm³, ensure uniform and reliable film deposition even under extreme conditions.

Terbium Oxide (Tb4O7) Sputtering Target Applications

- Thin Film Deposition: Ideal for producing uniform layers in the manufacturing of semiconductors and electronic devices.
- Surface Coatings: Used in PVD processes (Physical Vapor Deposition) for optical, photovoltaic, and protective coatings.
- Display Technologies: Suitable for the manufacture of advanced display panels and other optoelectronic applications.
- Research and Development: Employed in various scientific and industrial R&D processes requiring high-performance materials.
- Microelectronics: Critical for producing components in microelectronic devices.

Terbium Oxide (Tb4O7) Sputtering Target Packing

Our Terbium Oxide (Tb4O7) Sputtering Targets are carefully packaged to maintain product integrity during transportation. Standard packaging includes vacuum-sealed arrangements in secure containers, with custom packaging options available upon request.

Frequently Asked Questions

Q: What are the main applications of the Terbium Oxide (Tb4O7) sputtering target?
A: It is primarily used in thin film deposition, surface coating processes, display technology manufacturing, microelectronics, and advanced R&D applications.

Q: How is the purity of the sputtering target ensured?
A: Our products undergo stringent quality controls to achieve and maintain a purity level of ≥99%.

Q: Can I request a custom shape for the sputtering target?
A: Yes, in addition to standard disc shapes, our targets can be custom-manufactured to meet specific production requirements.

Q: Why is the high melting point of ~2340℃ important?
A: The high melting point ensures that the target maintains its structural integrity under high-temperature sputtering conditions, resulting in consistent performance during operation.

Q: Which industries benefit most from using the Terbium Oxide (Tb4O7) sputtering target?
A: Industries such as semiconductor manufacturing, display technology, microelectronics, and scientific research benefit from the exceptional properties and reliable performance.