ST0193 Thulium Oxide (Tm2O3) Sputtering Target

Thulium Oxide (Tm2O3) Sputtering Target Description

The Thulium Oxide (Tm2O3) Sputtering Target has been designed for the precise deposition of thin films in electronic and optical applications. With a chemical composition of Tm₂O₃ and a purity of ≥99%, it ensures consistent and reproducible sputtering performance. The target is available in disk form or can be customised to specific sizes to meet various industrial requirements. Due to its high melting point and density, it is suitable for hard sputtering environments, making it an excellent choice for high-temperature processes and demanding applications.

Thulium Oxide (Tm2O3) Sputtering Target Applications

- Microelectronics: Ideal for the fabrication of thin films in semiconductor manufacturing.
- Optical Coatings: For the deposition of high-quality optical layers in modern photonic devices.
- Energy Applications: Suitable for high-temperature coatings in power and energy devices.
- Research and Development: Used in advanced material studies and experimental sputtering processes.

Thulium Oxide (Tm2O3) Sputter Target Packaging

Our Thulium Oxide sputtering targets are securely packaged in vacuum-sealed containers to maintain material integrity during storage and transport. Custom packaging options, including bag or drum configurations, are available to meet your specific requirements.

Frequently Asked Questions

Q: What are the main advantages of using Thulium Oxide in sputtering targets?
A: Thulium Oxide provides exceptional purity, high thermal stability, and excellent chemical resistance, making it ideal for advanced thin film deposition applications.

Q: Can the shape and size of the sputtering target be customised?
A: Yes, our Thulium Oxide sputtering targets are available in standard disk form or can be manufactured according to your specific requirements.

Q: In which industries are Thulium Oxide sputtering targets typically used?
A: They are widely used in microelectronics, optical coatings, the energy sector, and research, where precision and material stability are critical.

Q: How does the high melting point of Thulium Oxide affect the sputtering process?
A: The high melting point ensures that the target material remains stable during sputtering, thereby ensuring uniform film deposition and improved process reliability.

Q: What quality assurance measures are taken for these sputtering targets?
A: Our targets undergo rigorous quality control protocols, including purity testing and performance evaluations, to ensure that they consistently meet the high standards required for advanced industrial applications.