ST0195 Titanium Trioxide (Ti2O3) Sputtering Target

Titanium Trioxide (Ti2O3) Sputtering Target Description

The Titanium Trioxide (Ti2O3) Sputtering Target has been meticulously developed to meet the stringent requirements of modern thin-film deposition processes. This sputter target is manufactured with a focus on high purity (≥99%) and precision, and is available as standard discs or can be custom-fabricated to meet specific industrial specifications. With a melting point of approximately 2130℃ and a density of 4.49 g/cm³, this material is optimised for high-temperature applications in the advanced coatings and semiconductor industries. Our sputter target is designed for excellent performance and reproducibility, and supports reliable and uniform film formation for various high-tech applications.

Titanium Trioxide (Ti2O3) Sputtering Target Applications

- Thin-film deposition: Essential for the production of semiconductor devices, optical coatings, and microelectronic components.
- Modern coatings: Used in the fabrication of wear-resistant high-temperature coatings across various industries.
- Research and development: Ideal for experimental setups within materials science and engineering research.
- Manufacturing of electronic components: Supports the deposition processes required for modern electronic and sensor devices.

Titanium Trioxide (Ti2O3) Sputtering Target Packaging

Our Titanium Trioxide (Ti2O3) Sputtering Target is packaged according to customer specifications to ensure optimal preservation and ease of handling. Standard packaging methods include vacuum sealing and custom packaging configurations to maintain material integrity during transport and storage.

Frequently Asked Questions

Q: What makes Titanium Trioxide (Ti2O3) an ideal material for sputter targets?
A: Its high purity (≥99%), high melting point, and robust physical properties ensure consistent performance in high-temperature coating processes.

Q: Are the shapes of the sputter targets customisable?
A: Yes, the targets are available as standard discs as well as in custom shapes to meet specific application requirements.

Q: What advantages does the high melting point of ~2130℃ provide for sputtering applications?
A: The high melting point allows the material to withstand significant thermal stresses during deposition, thereby ensuring durability and performance stability.

Q: What role does Indium bonding play in these sputter targets?
A: Indium bonding increases the adhesion strength between the target material and the backing plate, improving heat transfer and overall performance of the target.

Q: In which industries are Titanium Trioxide sputter targets commonly used?
A: They are commonly employed in semiconductor manufacturing, optical coating production, modern electronics, and research laboratories engaged in thin film deposition.