ST0203 Zinc Oxide (ZnO) Sputtering Target

Zinc Oxide (ZnO) Sputtering Target Description

The Zinc Oxide (ZnO) Sputtering Target is a high-performance material designed for precise deposition in advanced industrial applications. This target is produced under strict purity requirements, ensuring optimal film uniformity and deposition efficiency during RF sputtering processes. Its excellent thermal stability and consistent physical properties make it ideal for the production of thin films used in microelectronics, photovoltaics, and display technology.

Zinc Oxide (ZnO) Sputtering Target Applications

- Thin film deposition: Suitable for producing high-quality, uniform coatings in the semiconductor and microelectronics industry.
- Photovoltaic panels: Utilised for manufacturing transparent conductive layers for solar cells.
- Display technology: Essential for creating layers in flat-panel displays and touch screens.
- Sensor devices: Provides reliable performance in the fabrication of optical and chemical sensors.
- Research and development: Ideal for experimental sputtering processes in modern materials research.

Zinc Oxide (ZnO) Sputtering Target Packing

Our Zinc Oxide (ZnO) Sputtering Target is packaged under strict quality control to ensure its integrity during storage and transport.
Vacuum-sealed packaging: Options available in various custom sizes to meet specific customer requirements.

Frequently Asked Questions

Q: What is the main advantage of using a Zinc Oxide Sputtering Target?
A: It provides high purity and excellent uniformity during deposition, which is crucial for the production of high-performance thin films in various electronic and photovoltaic applications.

Q: What advantages does the RF sputtering process offer for the deposition process?
A: RF sputtering allows for precise control of film thickness and uniformity, making it ideal for sensitive thin film applications, particularly with insulating materials such as ZnO.

Q: Can the target be customised to specific size requirements?
A: Yes, the Zinc Oxide Sputtering Target is available in custom shapes and sizes to meet various application needs.

Q: In which industries are Zinc Oxide Sputtering Targets typically used?
A: They are commonly utilised in microelectronics, display technology, the manufacture of photovoltaic cells, and the production of sensor devices.

Q: How is the quality of the sputtering targets ensured?
A: Our targets undergo strict quality control during production, including purity and consistency testing, to ensure optimal performance in demanding environments.