Discontinued (Discontinued) ST0205 Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target

Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target Description

The Zinc Oxide with Gallium Oxide Sputtering Target is engineered for high-performance thin film deposition applications. Manufactured with advanced precision control, this target ensures a uniform composition and exceptional stability during the sputtering process. Its unique blend of ZnO and Ga₂O₃ provides enhanced optical and electronic properties, making it ideal for semiconductor, optoelectronic, and sensor applications. The product is tailored to meet the exacting demands of modern industrial and research environments.

Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target Applications

·         Semiconductor Thin Film Deposition: Ideal for fabricating high-quality thin films in semiconductor devices.

·         Optoelectronics: Suitable for coating applications in solar cells, LEDs, and photodetectors.

·         Sensors: Utilized in the production of sensitive and reliable gas or chemical sensors.

·         Research and Development: Supports advanced materials research and prototype development.

·         Coating Technologies: Employed in various surface modification processes for enhanced device performance.

Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target Packaging

Our Zinc Oxide with Gallium Oxide Sputtering Target is carefully packaged to ensure product integrity and prevent contamination. Products are typically vacuum-sealed and securely packed to maintain quality during storage and transportation. Custom packaging solutions are available upon request to meet specific customer requirements.

Frequently Asked Questions

Q: What is sputtering and how does this target work in the process?
A: Sputtering is a physical vapor deposition process where energetic particles are used to eject atoms from a target material. The particles then deposit on a substrate, forming a thin film. This target’s uniform composition ensures consistent thin film quality.

Q: What are the benefits of using a ZnO/Ga₂O₃ sputtering target?
A: The ZnO/Ga₂O₃ sputtering target offers high purity and precise composition control, leading to superior thin film deposition. Its unique properties enhance optical and electronic performance, which is ideal for semiconductor and optoelectronic applications.

Q: How is the purity (≥99%) maintained during manufacturing?
A: The manufacturing process employs advanced refining techniques and strict quality control measures at every stage. Continuous monitoring and testing ensure the purity and consistency of the ZnO/Ga₂O₃ composition.

Q: Can the shape and size of the sputtering target be customized?
A: Yes, the target is available in disc shapes or can be custom-made according to specific customer requirements, offering flexibility for different sputtering system designs.

Q: What quality assurance measures are implemented for this product?
A: Our production process adheres to rigorous quality standards, including precision control, in-process inspections, and final product testing. These measures ensure that every sputtering target meets the high-performance criteria required by advanced industrial and research applications.