Discontinued (Discontinued) ST0206 Zirconium Oxide (ZrO2) Sputtering Target

Zirconium Oxide (ZrO2) Sputtering Target Description

The sputtering target made from zirconium oxide (ZrO2) is manufactured with high precision to ensure a high purity and uniform structure, which are essential for advanced sputtering processes. This target meets the stringent requirements of modern microelectronics and thin film applications. It exhibits excellent thermal stability and resistance to degradation under extreme conditions. Its customisable shapes and sizes offer versatile solutions for a wide range of high-tech manufacturing processes.

Zirconium Oxide (ZrO2) Sputtering Target Applications

- Microelectronics: Ideal for the fabrication of semiconductor devices and integrated circuits.
- Thin Film Coatings: For the deposition of high-quality layers for optical, sensor, and electronic applications.
- Optoelectronics: Plays a significant role in LEDs, lasers, and other photonic devices.
- High Performance Ceramics: Enhances performance in high-temperature and corrosive environments.
- Research and Development: Perfect for experimental and prototyping setups in materials science.

Zirconium Oxide (ZrO2) Sputtering Target Packing

Our zirconium oxide (ZrO2) sputtering targets are handled with utmost care during storage and transport to ensure they remain in pristine condition. The products are custom packaged, typically in vacuum-sealed packaging, to protect them from contamination and physical damage during transport.

Frequently Asked Questions

Q: What are the main applications of a zirconium oxide sputtering target?
A: It is primarily used in thin film deposition, semiconductor device fabrication, optoelectronics, and the production of high-performance ceramics.

Q: Which sputtering techniques are compatible with this target?
A: This target is compatible with RF and RF-R sputtering systems, making it versatile for various deposition processes.

Q: What advantages does the high purity of this target provide for the sputtering process?
A: The high purity ensures uniform layer deposition, minimises contamination, and improves the overall quality and performance of the deposited layer.

Q: Can the shape and size of the sputtering target be customised?
A: Yes, the zirconium oxide sputtering target can be customised in shape and size to meet specific customer requirements.

Q: Which industries typically use zirconium oxide sputtering targets?
A: Industries such as microelectronics, optoelectronics, high-performance ceramics, and materials research widely use these targets due to their precision and durability.