Discontinued (Discontinued) ST0213 Hafnium Nitride (HfN) Sputtering Target

Hafnium Nitride (HfN) Sputtering Target Description

The Hafnium Nitride (HfN) sputtering target is manufactured to meet the strict requirements of modern sputtering applications. With a purity of ≥99%, this target is suitable for use in RF and RF-R sputtering systems, ensuring reliable deposition of thin films in semiconductor fabrication, optical coatings, and microelectronic applications. With a high melting point of 3310℃ and a density of 13.2 g/cm³, it is designed to withstand extreme operating conditions while providing precise and consistent performance.

Hafnium Nitride (HfN) Sputtering Target Applications

- Semiconductor Manufacturing: Essential for producing high-quality thin films in integrated circuits and microelectronic devices.
- Optical Coatings: Provides uniform coatings for lenses, mirrors, and other optical components.
- Microelectronic Devices: Ensures excellent performance in the deposition of conductive and insulating layers.
- Industrial Coatings: Widely used in the production of wear-resistant and corrosion-resistant surface coatings.

Hafnium Nitride (HfN) Sputtering Target Packing

Our Hafnium Nitride (HfN) sputtering targets are carefully packed under controlled conditions to maintain their high purity and material integrity. We offer custom packaging solutions tailored to meet the specific requirements of our customers, ensuring safe transport and storage.

Frequently Asked Questions

Q: What is sputtering in relation to thin film deposition?
A: Sputtering is a physical vapour deposition process in which atoms are ejected from a target material by energetic ion bombardment and subsequently deposit onto a substrate to form a thin film.

Q: Why is the purity of the sputtering target important?
A: A high purity level ensures that the deposited film contains minimal impurities, leading to improved electrical, optical, and mechanical properties that are critical for modern applications.

Q: What are the benefits of RF and RF-R sputtering?
A: RF and RF-R sputtering offer precise control over film uniformity and deposition rates, making them ideal for producing high-quality, consistent thin films in the fabrication of complex devices.

Q: What advantages do custom sizes offer for sputtering target applications?
A: Offering custom sizes allows the sputtering target to be tailored to specific equipment dimensions and process requirements, optimising performance and reducing material waste.

Q: In which industries are hafnium nitride sputtering targets typically used?
A: Industries such as semiconductors, optics, microelectronics, and industrial coatings utilise hafnium nitride sputtering targets due to their superior thermal stability, high melting point, and excellent material properties.