ST0226 Niobium Carbide (NbC) Sputtering Target

Niobium Carbide (NbC) Sputtering Target Description

The Niobium carbide (NbC) sputtering target is manufactured using advanced techniques to deliver exceptional quality and performance. With a purity of ≥99%, this target provides consistent and reliable film deposition when used with RF sputtering systems. Its high melting point and excellent thermal cycling resistance make it suitable for demanding applications in microelectronics, semiconductor device fabrication, and protective coating technology. The mechanical properties and chemical stability of the material contribute to an extended lifespan and consistent performance in high-temperature environments.

Niobium Carbide (NbC) Sputtering Target Applications

- Thin film deposition: Ideal for producing precise, uniform films in semiconductors and microelectronic devices.
- Industrial coatings: For depositing wear-resistant and corrosion-protective coatings on various substrates.
- Optoelectronic devices: Enables the fabrication of high-quality films for optical components and sensors.
- Advanced research: Utilised in laboratories for the development of next-generation materials and surface techniques.

Niobium Carbide (NbC) Sputtering Target Packing

Our niobium carbide sputtering targets are securely packaged to ensure flawless quality during handling and transport. Custom packaging solutions are available to meet specific customer requirements, providing optimal protection and ease of handling.

Frequently Asked Questions

Q: What are the main applications of NbC sputtering targets?
A: NbC sputtering targets are primarily used for thin film deposition in semiconductor manufacturing, for industrial coatings, and for fabricating optoelectronic devices.

Q: Which sputtering method is recommended for NbC targets?
A: RF sputtering is the recommended method for processing NbC targets to achieve uniform film deposition.

Q: What advantages does the high melting point of NbC provide for sputtering applications?
A: The high melting point (3613℃) ensures excellent thermal stability, making NbC suitable for high-temperature processes and reducing the risk of target degradation.

Q: Can NbC sputtering targets be customised?
A: Yes, targets can be manufactured in various shapes, such as discs, or in custom configurations tailored to specific application requirements.

Q: In which industries are NbC sputtering targets typically used?
A: NbC sputtering targets are commonly employed in industries such as microelectronics, semiconductor fabrication, advanced coatings, and optoelectronics due to their reliability and performance.