Discontinued (Discontinued) ST0229 Titanium Carbide (TiC) Sputtering Target

Titanium Carbide (TiC) Sputtering Target Description

The Titanium Carbide (TiC) Sputtering Target is produced using advanced processing techniques to achieve a purity level of ≥99%. This target is designed specifically for RF sputtering applications and provides notable thermal stability and chemical inertness, ensuring reliable performance in the deposition of thin films and surface coatings. It is available in disc form or as a custom solution to meet the precise requirements of the high-tech manufacturing industry.

Titanium Carbide (TiC) Sputtering Target Applications

- Semiconductor thin film deposition: Ideal for the production of durable and conductive layers in microelectronics.
- Formation of hard coatings: For the deposition of protective layers on tools, moulds, and cutting surfaces.
- MEMS and microelectronic devices: Provides high stability for the fabrication of complex devices.
- Plasma etching processes: Enhances the precision and uniformity of etching in modern production lines.
- Surface modification: Suitable for improving the performance and longevity of industrial components.

Titanium Carbide (TiC) Sputtering Target Packing

Our Titanium Carbide Sputtering Target is carefully packaged to maintain its integrity and performance during storage and transportation. Standard packaging is vacuum-sealed and enclosed in protective covers. It is usually available in 5 kg per bag or according to custom specifications.

Frequently Asked Questions

Q: What are the ideal applications for a Titanium Carbide (TiC) Sputtering Target?
A: It is primarily used for semiconductor thin film deposition, hard coating applications, MEMS fabrication, plasma etching, and surface modification processes.

Q: What advantages does the RF sputtering process provide when using a TiC target?
A: RF sputtering with a TiC target results in enhanced plasma stability, improved film uniformity, and better control over the deposition process due to the high thermal stability of the material.

Q: Why is a purity level of ≥99% important for this product?
A: A high purity level ensures minimal contamination, resulting in excellent film quality, uniform sputtering performance, and a longer target lifespan.

Q: Can the target be customised to meet specific application requirements?
A: Yes, the Titanium Carbide Sputtering Target is available in disc form or can be custom-manufactured to meet unique specifications and sizes required for various industrial applications.

Q: What measures are taken to ensure the quality of the target during packaging and transportation?
A: The target is vacuum-sealed and securely packaged in specialised containers to maintain its high quality and protect it from environmental influences during storage and transport.